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US 12,620,561 B2Granted
Plasma processing apparatus and plasma processing method
AssigneeTokyo Electron Limited
InventorsNobuo Matsuki, Hiroyuki Matsuura, Taro Ikeda
Life of this patent
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Abstract
A plasma processing apparatus includes a processing container having an opening in a sidewall, a partition wall that covers the opening and defines an internal space communicating with an inside of the processing container, and an internal electrode that passes through the partition wall, is airtightly inserted into the internal space, and is supplied with RF power. A first gap is provided between the partition wall and the internal electrode.
Claims11
A plasma processing apparatus comprising:
- a processing container having an opening in a sidewall;
- a partition wall configured to cover the opening and define an internal space communicating with an inside of the processing container;
- an internal electrode that passes through the partition wall, is airtightly inserted into the internal space, and is supplied with RF power;
- and
- an external electrode provided outside the partition wall, the external electrode being grounded,
- wherein a first gap is provided between the partition wall and the internal electrode.
3 more elements
A plasma processing method comprising:
- providing a plasma processing apparatus including:
- a processing container having an opening in a sidewall;
- a partition wall configured to cover the opening and define an internal space communicating with an inside of the processing container;
- an internal electrode that passes through the partition wall, is airtightly inserted into the internal space, and is supplied with RF power, a first gap being provided between the partition wall and the internal electrode;
- and
- an external electrode provided outside the partition wall, the external electrode being grounded,
- performing a plasma processing on a substrate accommodated in the processing container,
- wherein the plasma processing includes generating plasma from a gas supplied to the internal space by applying the RF power to the internal electrode.
5 more elements
Dependencies are inferred from the claim text.