H01J 2237/082
Electron beam
H01J2237/082 (Electron beam) appears on 189 US grants and 208 published applications in this corpus.
Search patents in H01J- Granted patents
- 189
- Published applications
- 208
- Assignees
- 57
- Inventors
- 336
- Latest grant
- 18 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 1 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 5 |
| 2002 | 5 | 11 |
| 2003 | 4 | 8 |
| 2004 | 3 | 8 |
| 2005 | 5 | 10 |
| 2006 | 14 | 6 |
| 2007 | 8 | 18 |
| 2008 | 9 | 16 |
| 2009 | 7 | 18 |
| 2010 | 16 | 7 |
| 2011 | 11 | 7 |
| 2012 | 10 | 5 |
| 2013 | 6 | 3 |
| 2014 | 5 | 9 |
| 2015 | 5 | 4 |
| 2016 | 5 | 2 |
| 2017 | 5 | 4 |
| 2018 | 4 | 9 |
| 2019 | 14 | 7 |
| 2020 | 7 | 11 |
| 2021 | 12 | 8 |
| 2022 | 7 | 6 |
| 2023 | 7 | 6 |
| 2024 | 6 | 12 |
| 2025 | 7 | 4 |
| 2026 | 3 | 4 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Ion generation device and ion implanter18 Aug 2026US 12,712,144 B2Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Ion microscope14 Jul 2026US 12,683,113 B2National University of Singapore
- Ion source head and ion source head curved liner, deflector, or repeller13 Jan 2026US 12,525,421 B2Taiwan Semiconductor Manufacturing Company.Ltd
- System and method for ion source temperature control using symmetric or asymmetric application of force18 Nov 2025US 12,476,087 B2APPLIED Materials.Inc.
- Adjustable support for arc chamber of ion source9 Sep 2025US 12,412,725 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Ion generation apparatus9 Jul 2026US 2026/0196437 A1Fidelity semiconductor CORPORATION
- Ion source head and ion source head curved liner, deflector, or repeller23 Apr 2026US 2026/0112567 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Ion source and operating method thereof12 Mar 2026US 2026/0074138 A1Nissin Ion Equipment Co., Ltd.
- Ion source with coaxial gas conduit5 Mar 2026US 2026/0066211 A1
- Adjustable support for arc chamber of ion source16 Oct 2025US 2025/0323004 A1Taiwan Semiconductor Manufacturing Company.Ltd
Most cited
By later US patents
- Method for inspecting substrate, substrate inspecting system and electron beam apparatus113US 7,109,483 B2Ebara Corporation · 2006
- Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former61US 6,855,929 B2Ebara Corporation · 2005
- Electron beam apparatus and method of manufacturing semiconductor device using the apparatus56US 6,593,152 B2Ebara Corporation · 2003
- Inspection method, apparatus and system for circuit pattern55US 6,759,655 B2Hitachi, Ltd. · 2004
- Inspection method, apparatus and system for circuit pattern44US 6,388,747 B2Hitachi, Ltd. · 2002