H01J 2237/04756
With electrostatic means
Official title: with electrostatic means
H01J2237/04756 (With electrostatic means) appears on 128 US grants and 119 published applications in this corpus.
Search patents in H01J- Granted patents
- 128
- Published applications
- 119
- Assignees
- 48
- Inventors
- 226
- Latest grant
- 10 Feb 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 2 | 0 |
| 1996 | 2 | 0 |
| 1997 | 0 | 0 |
| 1998 | 4 | 0 |
| 1999 | 5 | 0 |
| 2000 | 2 | 0 |
| 2001 | 2 | 1 |
| 2002 | 6 | 3 |
| 2003 | 7 | 6 |
| 2004 | 1 | 6 |
| 2005 | 6 | 3 |
| 2006 | 5 | 8 |
| 2007 | 3 | 2 |
| 2008 | 5 | 3 |
| 2009 | 2 | 9 |
| 2010 | 3 | 5 |
| 2011 | 5 | 2 |
| 2012 | 4 | 6 |
| 2013 | 7 | 3 |
| 2014 | 3 | 2 |
| 2015 | 5 | 5 |
| 2016 | 4 | 5 |
| 2017 | 4 | 5 |
| 2018 | 5 | 2 |
| 2019 | 4 | 4 |
| 2020 | 4 | 6 |
| 2021 | 8 | 13 |
| 2022 | 6 | 4 |
| 2023 | 6 | 3 |
| 2024 | 2 | 3 |
| 2025 | 1 | 2 |
| 2026 | 2 | 8 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Charged particle assessment tool, inspection method10 Feb 2026US 12,548,735 B2ASML Netherlands B. V.
- Charged particle assessment tool, inspection method27 Jan 2026US 12,537,158 B2ASML Netherlands B. V.
- Charged particle assessment tool, inspection method23 Dec 2025US 12,505,978 B2ASML Netherlands B. V.
- Charged particle assessment tool, inspection method14 May 2024US 11,984,295 B2ASML Netherlands B. V.
- Stage apparatus suitable for a particle beam apparatus20 Feb 2024US 11,908,656 B2ASML Netherlands B. V.
- Composite Beam Apparatus13 Aug 2026US 2026/0237598 A1Hitachi High-Tech Corporation
- Charged Particle Beam Device6 Aug 2026US 2026/0229443 A1Hitachi High-Tech Corporation
- Ion implantation device18 Jun 2026US 2026/0171344 A1Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Electron Microscope and Specimen Observation Method11 Jun 2026US 2026/0162923 A1JEOL Ltd.
- Charged particle assessment tool, inspection method28 May 2026US 2026/0148935 A1ASML Netherlands B. V.
Most cited
By later US patents
- Particle-optical systems and arrangements and particle-optical components for such systems and arrangements98US 7,244,949 B2Applied Materials Israel Ltd. · 2007
- Scanning electron microscope90US 5,872,358 AHitachi, Ltd. · 1999
- Scanning electron microscope66US 6,847,038 B2Hitachi, Ltd. · 2005
- Twin beam charged particle column and method of operating thereof61US 8,378,299 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH · 2013
- Scanning electron microscope52US 5,900,629 AHitachi, Ltd. · 1999