Charged particle assessment tool, inspection method
AssigneeASML Netherlands B.V.
InventorMarco Jan-Jaco Wieland
Life of this patent
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Abstract
A charged particle assessment tool including: an objective lens configured to project a plurality of charged particle beams onto a sample, the objective lens having a sample-facing surface defining a plurality of beam apertures through which respective ones of the charged particle beams are emitted toward the sample; and a plurality of capture electrodes, each capture electrode adjacent a respective one of the beam apertures, configured to capture charged particles emitted from the sample.
Claims20
A charged particle assessment tool comprising:
- an objective lens array configured to project a plurality of charged particle beams onto a sample, the objective lens array defining a plurality of beam apertures through which respective ones of the charged particle beams can propagate toward the sample;
- and
- a plurality of sensor units, each sensor unit substantially surrounding a respective one of the beam apertures, configured to capture charged particles emitted from the sample.
An inspection method comprising:
- emitting a plurality of charged-particle beams through a plurality of beam apertures of an objective lens array to a sample;
- and
- capturing charged particles emitted by the sample, in response to the charged-particle beams, using a plurality of sensor units, each sensor unit surrounding a respective one of the beam apertures and each sensor unit having a circular perimeter and an area extending between the respective aperture of the sensor unit and the perimeter of the sensor unit.
A charged particle assessment tool comprising:
- an objective lens array configured to project a plurality of charged particle beams onto a sample, the objective lens array defining a plurality of beam apertures through which respective ones of the charged particle beams can propagate toward the sample and the objective lens array being an electrostatic array objective lens;
- and
- a plurality of sensor units, each sensor unit substantially surrounding a respective one of the beam apertures, configured to capture charged particles emitted from the sample.
Dependencies are inferred from the claim text.