H01J 2237/022
Avoiding or removing foreign or contaminating particles, debris or deposits on sample
Official title: Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube
H01J2237/022 (Avoiding or removing foreign or contaminating particles, debris or deposits on sample) appears on 735 US grants and 699 published applications in this corpus.
Search patents in H01J- Granted patents
- 735
- Published applications
- 699
- Assignees
- 259
- Inventors
- 1,749
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1982 | 1 | 0 |
| 1983 | 1 | 0 |
| 1984 | 1 | 0 |
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 2 | 0 |
| 1990 | 4 | 0 |
| 1991 | 3 | 0 |
| 1992 | 6 | 0 |
| 1993 | 10 | 0 |
| 1994 | 15 | 0 |
| 1995 | 20 | 0 |
| 1996 | 17 | 0 |
| 1997 | 20 | 0 |
| 1998 | 25 | 0 |
| 1999 | 20 | 0 |
| 2000 | 22 | 0 |
| 2001 | 18 | 5 |
| 2002 | 23 | 30 |
| 2003 | 28 | 14 |
| 2004 | 16 | 21 |
| 2005 | 7 | 36 |
| 2006 | 18 | 41 |
| 2007 | 23 | 40 |
| 2008 | 19 | 39 |
| 2009 | 31 | 38 |
| 2010 | 21 | 30 |
| 2011 | 29 | 22 |
| 2012 | 25 | 28 |
| 2013 | 24 | 26 |
| 2014 | 25 | 29 |
| 2015 | 20 | 21 |
| 2016 | 20 | 24 |
| 2017 | 21 | 28 |
| 2018 | 23 | 33 |
| 2019 | 30 | 27 |
| 2020 | 46 | 34 |
| 2021 | 22 | 17 |
| 2022 | 21 | 23 |
| 2023 | 15 | 22 |
| 2024 | 13 | 28 |
| 2025 | 14 | 29 |
| 2026 | 14 | 14 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Focused ion beam apparatus and control method thereof29 Sep 2026US 12,749,647 B2Samsung Electronics Co., Ltd.
- Substrate processing system and particle removal method1 Sep 2026US 12,725,769 B2Tokyo Electron Limited
- Chamber with enhancement liner and methods for downstream residue management25 Aug 2026US 12,719,033 B2APPLIED Materials.Inc.
- Stage device, charged particle beam apparatus, and vacuum apparatus18 Aug 2026US 12,712,145 B2Hitachi High-Tech Corporation
- Air bearing shaft with wide operating temperature range11 Aug 2026US 12,706,271 B2APPLIED Materials.Inc.
- Backup abatement reactor for a processing tool24 Sep 2026US 2026/0290764 A1APPLIED Materials.Inc.
- Electron Microscope10 Sep 2026US 2026/0269174 A1Hitachi High-Tech Corporation
- System and method for cleaning of transmission electron microscope chamber20 Aug 2026US 2026/0241422 A1IBSS Group
- Cleaning device and method for removing contamination particles from a surface to be cleaned6 Aug 2026US 2026/0225137 A1ASML Netherlands B. V.
- Apparatus for contamination reduction in charged particle beam systems6 Aug 2026US 2026/0229447 A1ASML Netherlands B. V.
Most cited
By later US patents
- CVD Processing chamber1,003US 5,558,717 AAPPLIED Materials.Inc. · 1996
- Method for preventing contamination in a plasma process chamber558US 6,482,331 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2002
- Focus ring for semiconductor wafer processing in a plasma reactor469US 5,685,914 AAPPLIED Materials.Inc. · 1997
- Object-processing apparatus controlling production of particles in electric field or magnetic field380US 8,051,799 B2Renesas Electronics Corporation · 2011
- Magnetron sputtering apparatus and process326US 4,851,095 AOptical Coating Laboratory, Inc. · 1989