G03F 1/58
Having two or more different absorber layers
Official title: having two or more different absorber layers, e.g. stacked multilayer absorbers
G03F1/58 (Having two or more different absorber layers) appears on 216 US grants and 250 published applications in this corpus.
Search patents in G03F- Granted patents
- 216
- Published applications
- 250
- Assignees
- 77
- Inventors
- 404
- Latest grant
- 7 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1979 | 3 | 0 |
| 1980 | 0 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 1 | 0 |
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 2 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 1 | 0 |
| 2001 | 4 | 1 |
| 2002 | 4 | 3 |
| 2003 | 4 | 5 |
| 2004 | 2 | 2 |
| 2005 | 5 | 3 |
| 2006 | 2 | 2 |
| 2007 | 1 | 4 |
| 2008 | 1 | 7 |
| 2009 | 1 | 5 |
| 2010 | 8 | 6 |
| 2011 | 7 | 8 |
| 2012 | 7 | 11 |
| 2013 | 6 | 12 |
| 2014 | 11 | 10 |
| 2015 | 13 | 9 |
| 2016 | 9 | 9 |
| 2017 | 9 | 10 |
| 2018 | 7 | 13 |
| 2019 | 4 | 20 |
| 2020 | 20 | 12 |
| 2021 | 16 | 27 |
| 2022 | 14 | 22 |
| 2023 | 19 | 18 |
| 2024 | 14 | 11 |
| 2025 | 8 | 9 |
| 2026 | 5 | 11 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Target processing device and target processing method7 Jul 2026US 12,676,292 B2Kioxia Corporation
- Blank mask and photomask using the same9 Jun 2026US 12,650,640 B2LuminaMask Co., Ltd.
- Method and apparatus for manufacturing a photomask from a blank mask3 Mar 2026US 12,566,369 B2SK enpulse Co., Ltd.
- Photomask blank, manufacturing method of photomask and photomask27 Jan 2026US 12,535,728 B2Shin-Etsu Chemical Co., Ltd.
- Extreme ultraviolet mask with alloy based absorbers6 Jan 2026US 12,517,423 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Reflective mask blank and reflective mask6 Aug 2026US 2026/0227686 A1Shin-Etsu Chemical Co., Ltd.
- Multi-layer absorber film for lithography mask blank11 Jun 2026US 2026/0161067 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Extreme ultraviolet mask with alloy based absorbers7 May 2026US 2026/0126716 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Masks, methods of manufacturing masks, and methods of manufacturing semiconductor device23 Apr 2026US 2026/0110958 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Method for manufacturing semiconductor device, grayscale mask, and semiconductor device23 Apr 2026US 2026/0114070 A1Lite-On Singapore Pte. Ltd.
Most cited
By later US patents
- Extreme ultraviolet lithography process and mask331US 8,841,047 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2014
- Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof312US 8,764,995 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2014
- EUV mask and method for forming the same127US 8,691,476 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2014
- Reflection type mask53US 5,052,033 ACanon Kabushiki Kaisha · 1991
- High energy laser mask and method of making same42US 4,923,772 A1990