G03F 1/54
Absorbers
Official title: Absorbers, e.g. of opaque materials
G03F1/54 (Absorbers) appears on 903 US grants and 923 published applications in this corpus.
Search patents in G03F- Granted patents
- 903
- Published applications
- 923
- Assignees
- 246
- Inventors
- 1,519
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 6 | 0 |
| 1977 | 6 | 0 |
| 1978 | 8 | 0 |
| 1979 | 7 | 0 |
| 1980 | 8 | 0 |
| 1981 | 13 | 0 |
| 1982 | 10 | 0 |
| 1983 | 15 | 0 |
| 1984 | 10 | 0 |
| 1985 | 12 | 0 |
| 1986 | 12 | 0 |
| 1987 | 12 | 0 |
| 1988 | 14 | 0 |
| 1989 | 6 | 0 |
| 1990 | 8 | 0 |
| 1991 | 4 | 0 |
| 1992 | 7 | 0 |
| 1993 | 4 | 0 |
| 1994 | 4 | 0 |
| 1995 | 4 | 0 |
| 1996 | 10 | 0 |
| 1997 | 10 | 0 |
| 1998 | 7 | 0 |
| 1999 | 3 | 0 |
| 2000 | 8 | 0 |
| 2001 | 12 | 3 |
| 2002 | 14 | 24 |
| 2003 | 18 | 26 |
| 2004 | 14 | 18 |
| 2005 | 21 | 18 |
| 2006 | 14 | 19 |
| 2007 | 7 | 21 |
| 2008 | 11 | 28 |
| 2009 | 7 | 19 |
| 2010 | 32 | 21 |
| 2011 | 20 | 35 |
| 2012 | 27 | 34 |
| 2013 | 26 | 44 |
| 2014 | 34 | 26 |
| 2015 | 33 | 26 |
| 2016 | 28 | 32 |
| 2017 | 29 | 26 |
| 2018 | 26 | 43 |
| 2019 | 25 | 55 |
| 2020 | 47 | 60 |
| 2021 | 56 | 72 |
| 2022 | 50 | 68 |
| 2023 | 49 | 63 |
| 2024 | 48 | 69 |
| 2025 | 33 | 40 |
| 2026 | 14 | 33 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Methods for fabricating an optical waveguide and a display device and photomask used therein15 Sep 2026US 12,736,873 B2General Interface Solution Limited
- Mask for extreme ultraviolet lithography and method for manufacturing same7 Jul 2026US 12,675,039 B2Iucf-Hyu (Industry-University Cooperation Foundation Hanyang University)
- Target processing device and target processing method7 Jul 2026US 12,676,292 B2Kioxia Corporation
- Method of preparing laminate and laminate for optical use9 Jun 2026US 12,649,854 B2LuminaMask Co., Ltd.
- Blank mask and photomask using the same9 Jun 2026US 12,650,640 B2LuminaMask Co., Ltd.
- Euv photomask and manufacturing method thereof8 Oct 2026US 2026/0310060 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Reflective mask blank, reflective mask, reflective mask blank producing method, and reflective mask producing method8 Oct 2026US 2026/0310066 A1AGC Inc.
- Euv mask registration control method and euv mask manufacturing method including the control method1 Oct 2026US 2026/0299397 A1Samsung Electronics Co., Ltd.
- Reflective photomask and method for manufacturing reflective photomask1 Oct 2026US 2026/0299398 A1Rapidus Corporation
- Reflective mask blank, reflective mask, reflective mask blank manufacturing method, and reflective mask manufacturing method17 Sep 2026US 2026/0277093 A1AGC Inc.
Most cited
By later US patents
- Semiconductor substrate process using an optically writable carbon-containing mask539US 7,429,532 B2APPLIED Materials.Inc. · 2008
- Extreme ultraviolet lithography process and mask331US 8,841,047 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2014
- Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof312US 8,764,995 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2014
- Gray scale mask and depth pattern transfer technique using inorganic chalcogenide glass190US 5,998,066 AAerial Imaging Corporation · 1999
- Process for etching a metal layer suitable for use in photomask fabrication180US 7,682,518 B2APPLIED Materials.Inc. · 2010