G03F 1/56
Organic absorbers
Official title: Organic absorbers, e.g. of photo-resists
G03F1/56 (Organic absorbers) appears on 149 US grants and 86 published applications in this corpus.
Search patents in G03F- Granted patents
- 149
- Published applications
- 86
- Assignees
- 70
- Inventors
- 283
- Latest grant
- 5 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 2 | 0 |
| 1979 | 0 | 0 |
| 1980 | 3 | 0 |
| 1981 | 5 | 0 |
| 1982 | 8 | 0 |
| 1983 | 5 | 0 |
| 1984 | 5 | 0 |
| 1985 | 5 | 0 |
| 1986 | 8 | 0 |
| 1987 | 6 | 0 |
| 1988 | 3 | 0 |
| 1989 | 4 | 0 |
| 1990 | 3 | 0 |
| 1991 | 1 | 0 |
| 1992 | 2 | 0 |
| 1993 | 2 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 1 | 0 |
| 1999 | 1 | 0 |
| 2000 | 5 | 0 |
| 2001 | 5 | 1 |
| 2002 | 5 | 13 |
| 2003 | 7 | 15 |
| 2004 | 6 | 2 |
| 2005 | 10 | 4 |
| 2006 | 4 | 5 |
| 2007 | 3 | 3 |
| 2008 | 2 | 3 |
| 2009 | 1 | 1 |
| 2010 | 4 | 3 |
| 2011 | 1 | 1 |
| 2012 | 2 | 2 |
| 2013 | 0 | 6 |
| 2014 | 1 | 4 |
| 2015 | 6 | 4 |
| 2016 | 2 | 0 |
| 2017 | 4 | 1 |
| 2018 | 1 | 2 |
| 2019 | 2 | 0 |
| 2020 | 0 | 2 |
| 2021 | 2 | 1 |
| 2022 | 0 | 2 |
| 2023 | 1 | 5 |
| 2024 | 3 | 4 |
| 2025 | 2 | 0 |
| 2026 | 2 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Lithography techniques for reducing defects5 May 2026US 12,619,154 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Interstitial type absorber for extreme ultraviolet mask27 Jan 2026US 12,535,740 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Apparatus for treating substrate and method for treating a substrate7 Oct 2025US 12,436,463 B2Semes Co., Ltd.
- Reflective mask1 Jul 2025US 12,346,019 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Semiconductor device and method of forming the same30 Jul 2024US 12,050,398 B2Micron Technology, Inc.
- Interstitial type absorber for extreme ultraviolet mask7 May 2026US 2026/0126729 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Reflective photomask blank, and method for manufacturing reflective photomask22 Jan 2026US 2026/0023316 A1Shin-Etsu Chemical Co., Ltd.
- Lithography techniques for reducing defects19 Sep 2024US 2024/0310735 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Reflective mask12 Sep 2024US 2024/0302731 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Apparatus for treating substrate and method for treating a substrate13 Jun 2024US 2024/0192602 A1Semes Co., Ltd.
Most cited
By later US patents
- Light absorbing coating75US 4,822,718 ABrewer Science Inc. · 1989
- Photosensitive image forming material and an image forming method using same68US 4,268,601 AFuji Photo Film Co., Ltd. · 1981
- Laser-based system for the total repair of photomasks54US 4,727,234 AGould Inc. · 1988
- Manufacturing method of photomask and photomask52US 6,656,644 B2Hitachi, Ltd. · 2003
- Process for preparing a mask for use in manufacturing a semiconductor device50US 4,068,018 ANippon Electric Co., Ltd. · 1978