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US 12,346,019 B2Granted
Reflective mask
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsPei-Cheng Hsu, Ta-Cheng Lien, Hsin-Chang Lee
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Abstract
A reflective mask includes a substrate, a reflective multilayer disposed over the substrate, a capping layer disposed over the reflective multilayer, an intermediate layer disposed over the capping layer, an absorber layer disposed over the intermediate layer, and a cover layer disposed over the absorber layer. The intermediate layer includes a material having a lower hydrogen diffusivity than a material of the capping layer.
Claims20
A reflective mask, comprising:
- a substrate;
- a reflective multilayer disposed on the substrate;
- a capping layer disposed over the reflective multilayer;
- a photo catalytic layer disposed over the capping layer, the photo catalytic layer being capable of catalytically decomposing a hydrocarbon residue formed on the reflective mask upon exposure to extreme ultraviolet radiation;
- and
- an absorber layer disposed over the photo catalytic layer, the absorber layer comprising an opening exposing a portion of the photo catalytic layer.
3 more elements
A reflective mask, comprising:
- a substrate;
- a reflective multilayer disposed over the substrate;
- a capping layer disposed over the reflective multilayer;
- an absorber layer disposed over the capping layer;
- and
- a cover layer disposed over the absorber layer,
- wherein an uppermost layer of the reflective multilayer includes Mo and is in contact with the capping layer.
4 more elements
A reflective mask, comprising:
- a substrate;
- a reflective multilayer disposed on the substrate;
- a hydrogen diffusion barrier layer disposed on the reflective multilayer;
- a capping layer disposed on the hydrogen diffusion barrier layer;
- and
- an absorber layer disposed on the capping layer.
3 more elements
Dependencies are inferred from the claim text.