Light absorbing coating
AssigneeBrewer Science Inc.
InventorsWilliam J. Latham, Terry L. Brewer, Jeffry Hunninghake
Life of this patent
Estimating the term…
Abstract
A broad spectrum light absorbing medium to be coated over photosensitive layers, such as a photoresist for integrated circuit "chips" to act as a true surface for autofocus of the camera used to expose the photoresist. The product may also be used where a light impermeable, high contrast or black coating is needed, such as, in liquid crystal displays and light emitting diodes, photodiodes, solid state lasers, or patterning apertures on light-wave modulators. The coating absorbs light from 200 to 1000 nanometers. The coating has a polymer vehicle which can form a tightly adhering, thin, smooth and uniform coating. The coating includes a light absorbing dye. This light absorbing layer may be imageable.
Claims20
A broad spectrum light absorbing coating material for microelectronic photolithography consisting essentially of a polyimide precursor vehicle and at least on soluble light absorbing dye in a solvent system, the dye being substantially completely soluble in the solvent and vehicle system and being effective to absorb substantially all light across a broad spectrum of light, from in the ultra violet spectrum to in the infra red spectrum, when the coating is coated on a microelectronic photolithographic substrate, the coating system having a high electrical resistivity and a high dielectric strength when coated on a substrate, and being effective to provide a uniform, tightly adhering coating, the coating being photolithographically imagable and effective to produce microelectronic images having fine line resolution and being developable and etchable by wet and dry etch microelectronic photolithography processes, the coating having a high specific absorptivity over a broad spectrum of light effective to provide a substantially black coating.
A light absorbing coating material for improving the performance of automatic focus equipment used in microelectronic photolithography consisting essentially of at least one soluble light absorbing dye in a vehicle and solvent system, the dye being effective to absorb substantially all unreflected light, from about 200 to about 1000 nanometers across the spectrum used in automatic focus processes, when coated on a microelectronic substrate, and being effective to provide a thin, uniform coating, the coating being compatible with subsequent processing of the microelectronic substrate including being readily removable by subsequent processing of the microelectronic substrate.
A light absorbing coating material for mask inspection systems used in microelectronic photolithography consisting essentially of at least one soluble light absorbing dye in a vehicle and solvent system, the dye being effective to absorb substantially all light across the spectrum used in microelectronic photolithography mask inspection systems, from about 200 to about 1000 nanometers, and being photolithographically imagable and developable in the mask inspection process, the coating being effective to provide a thin, uniform, coating and being effective to produce images having fine line resolution when used in a microelectronic photolithographic mask inspection system.
A broad spectrum light absorbing coating material for microelectronic photolithography consisting essentially of a polyimide precursor vehicle and at least one soluble light absorbing dye in a solvent system, the dye being substantially completely soluble in the solvent and vehicle system and being effective to absorb substantially all light across a broad spectrum of light, from about 200 nanometers to about 1000 nanometers, when the coating is coated on a microelectronic photolithographic substrate, the coating system having a high electrical resistivity and a high dielectric strength when coated on a substrate, and being effective to provide a uniform, tightly adhering coating, the coating being photolithographically imagable and effective to produce microelectronic images having fine line resolution and being developable and etchable by wet and dry etch microelectronic photolithography processes, the coating having a high specific absorptivity over a broad spectrum of light effective to provide a substantially black coating.
Dependencies are inferred from the claim text.