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US 12,436,463 B2Granted
Apparatus for treating substrate and method for treating a substrate
AssigneeSemes Co., Ltd.
InventorsMin Jung Park, Soo Bin Yong, Jae Hoon Park
Life of this patent
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Abstract
The inventive concept provides a substrate treating method. The substrate treating apparatus includes first treating including supplying a first liquid to a rotating substrate; and second treating including supplying a second liquid to the rotating substrate after the supplying of the first liquid, and wherein a rotation speed of a substrate is changed during the supplying of the first liquid to the rotating substrate.
Claims19
A substrate treating method comprising:
- first treating including supplying a first liquid to a rotating substrate;
- and
- second treating including supplying a second liquid to the rotating substrate after the supplying of the first liquid,
- wherein the first treating includes,
- a main diffusing including main supplying the first liquid to the rotating substrate to coat a whole area of the substrate with the first liquid and to remove particles attached on the substrate,
- subsequently a first drying including stopping supplying of the first liquid to the rotating the substrate, and
- subsequently a supplementary diffusing including supplementary supplying the first liquid to the rotating substrate to fill a space between patterns formed on the substrate,
- wherein in the main diffusing, a rotation speed of the substrate is increased during the supplying of the first liquid to the rotating substrate, and
- in the first drying, the rotation speed is increased from a highest speed of the main diffusing.
6 more elements
A substrate treating method for treating a substrate having patterns formed on a top surface thereof, the substrate treating method comprising:
- first supplying a first liquid to a rotating substrate to permeate the first liquid to a space between patterns;
- second supplying the first liquid to the rotating substrate to diffuse the first liquid toward an edge region of the substrate;
- after the second supplying, first drying including stopping the supply of the first liquid to the rotating substrate and rotating the substrate at a rotation speed greater than a rotation speed during the second supplying;
- and
- after the second supplying, supplementary diffusing including supplying the first liquid to the rotating substrate to secondly permeate the first liquid to the space between patterns, and
- wherein an average rotation speed of the substrate at the first supplying of the first liquid, a first average rotation speed of the substrate at the second supplying of the first liquid, and a second average rotation speed of the substrate at the supplementary diffusing are different from one another.
3 more elements
A substrate treating method comprising:
- first supplying a first treatment liquid to a rotating substrate for a first time, the rotating substrate rotating at a first rotation speed;
- subsequently second supplying the first treatment liquid to the rotating substrate for a second time approximately equal to the first time, the rotating substrate rotating at a second rotation speed greater than the first rotation speed;
- subsequently first drying including stopping the supply of the first treatment liquid to the rotating substrate for a third time less than the first time, the rotating substrate rotating at a third rotation speed greater than the second rotation speed;
- subsequently supplementary diffusing including resupplying the first treatment liquid to the rotating substrate for a fourth time greater than the third time and less than the first time, the rotating substrate rotating at a fourth rotation speed less than the first rotation speed;
- subsequently stopping rotating of the rotating substrate and stopping the resupplying the first treatment liquid for a fifth time, the fifth time less than the third time;
- and
- subsequently restarting rotating of the substrate to rotate the substrate at a fifth rotation speed and not supplying the first treatment liquid for a sixth time, the rotating of the substrate at the fifth rotation speed greater than the second rotation speed and less than the third rotation speed.
4 more elements
Dependencies are inferred from the claim text.