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US 12,050,398 B2Granted
Semiconductor device and method of forming the same
AssigneeMicron Technology, Inc.
InventorsHidenori Yamaguchi, Keizo Kawakita, Shigeru Sugioka
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Abstract
A semiconductor device includes a semiconductor substrate having a semiconductor substrate having a main surface including a first portion; a redistribution layer provided over the first portion of the main surface of the semiconductor substrate; an insulating layer covering the first portion of the main surface of the semiconductor substrate and the redistribution layer; and a first polyimide film covering the insulating layer; wherein the polyimide film has a substantially flat upper surface.
Claims10
A semiconductor device comprising:
- a semiconductor substrate having a main surface including a first region, a second region adjacent to the first region, and a third region separated from the first region;
- a redistribution layer provided partially on the first region of the main surface of the semiconductor substrate;
- a first portion of an insulating layer covering the first region of the main surface of the semiconductor substrate and the redistribution layer;
- and
- a first polyimide film covering the first portion of the insulating layer;
- a bonding pad exposed in the second region of the main surface by an opening, the opening including a surface of the first polyimide film;
- a second portion of the insulating layer provided on the third region;
- and
- a second polyimide film covering the second portion of the insulating layer,
- wherein the first polyimide film has a substantially flat upper surface,
- wherein the first polyimide film and the second polyimide film have substantially same thickness,
- wherein a first lateral surface of the bonding pad is directly covered by a third portion of the insulating layer, the third portion of the insulating layer being adjacent to the first polyimide film and the first portion of the insulating layer,
- wherein a second lateral surface of the bonding pad is directly covered by a fourth portion of the insulating layer, the fourth portion of the insulating layer being adjacent to the second polyimide film and the second portion of the insulating layer, and
- wherein the first lateral surface and the second lateral surface of the bonding pad are perpendicular to a top surface of the bonding pad, wherein an entirety of the top surface of the bonding pad is exposed by the insulating layer.
11 more elements
A semiconductor device comprising:
- a redistribution layer provided over the semiconductor substrate;
- a bonding pad provided over the semiconductor substrate;
- a redistribution layer formation region where the redistribution layer is formed;
- a chip end;
- a pad end region arranged between the bonding pad and the chip end;
- a first polyimide film provided over the redistribution layer formation region so as to cover the semiconductor substrate and the redistribution layer;
- and
- a second polyimide film disposed in the pad end region;
- wherein the first polyimide film has a substantially flat upper surface,
- wherein the bonding pad is disposed on the semiconductor substrate and is exposed adjacent to the redistribution layer formation region,
- wherein the first polyimide film and the second polyimide film have substantially same thickness,
- wherein a lower edge of the surface of the first polyimide film is in the same plane as a top surface of the bonding pad,
- wherein lateral surfaces of the bonding pad that are perpendicular to the top surface of the bonding pad are covered by an insulating material, and
- wherein an entirety of the top surface of the bonding pad is exposed by the insulating material.
11 more elements
A semiconductor device comprising:
- a semiconductor substrate having a main surface including a first region, a second region adjacent to the first region, and a third region separated from the first region;
- a redistribution layer provided partially on the first region of the main surface of the semiconductor substrate;
- a first portion of an insulating layer covering the first region of the main surface of the semiconductor substrate and the redistribution layer;
- and
- a first polyimide film covering the first portion of the insulating layer;
- a bonding pad exposed in the second region of the main surface by an opening, the opening including a surface of the first polyimide film;
- a second portion of the insulating layer provided on the third region;
- and
- a second polyimide film covering the second portion of the insulating layer,
- wherein the first polyimide film has a substantially flat upper surface,
- wherein the first polyimide film and the second polyimide film have substantially same thickness,
- wherein a first lateral surface of the bonding pad is directly covered by a third portion of the insulating layer, the third portion of the insulating layer being adjacent to the first polyimide film and the first portion of the insulating layer,
- wherein a second lateral surface of the bonding pad is directly covered by a fourth portion of the insulating layer, the fourth portion of the insulating layer being adjacent to the second polyimide film and the second portion of the insulating layer, and
- wherein a lower edge of the surface of the first polyimide film of the opening is in the same plane as a top surface of the bonding pad, and wherein the top surface of the bonding pad is flush with the second portion of the insulating layer covering the second region of the main surface of the semiconductor substrate.
11 more elements
Dependencies are inferred from the claim text.