G03F 1/44
Testing or measuring features
Official title: Testing or measuring features, e.g. grid patterns, focus monitors, sawtooth scales or notched scales
G03F1/44 (Testing or measuring features) appears on 469 US grants and 499 published applications in this corpus.
Search patents in G03F- Granted patents
- 469
- Published applications
- 499
- Assignees
- 160
- Inventors
- 988
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1984 | 1 | 0 |
| 1985 | 0 | 0 |
| 1986 | 3 | 0 |
| 1987 | 2 | 0 |
| 1988 | 2 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 1 | 0 |
| 1996 | 3 | 0 |
| 1997 | 3 | 0 |
| 1998 | 9 | 0 |
| 1999 | 3 | 0 |
| 2000 | 7 | 0 |
| 2001 | 2 | 1 |
| 2002 | 6 | 5 |
| 2003 | 7 | 24 |
| 2004 | 16 | 14 |
| 2005 | 12 | 32 |
| 2006 | 13 | 27 |
| 2007 | 22 | 32 |
| 2008 | 28 | 28 |
| 2009 | 23 | 26 |
| 2010 | 34 | 31 |
| 2011 | 22 | 16 |
| 2012 | 16 | 12 |
| 2013 | 9 | 18 |
| 2014 | 14 | 15 |
| 2015 | 19 | 19 |
| 2016 | 19 | 14 |
| 2017 | 20 | 19 |
| 2018 | 21 | 18 |
| 2019 | 20 | 25 |
| 2020 | 24 | 15 |
| 2021 | 21 | 23 |
| 2022 | 12 | 17 |
| 2023 | 16 | 20 |
| 2024 | 14 | 27 |
| 2025 | 10 | 10 |
| 2026 | 10 | 11 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method for correcting lithography pattern of surface plasma22 Sep 2026US 12,743,017 B2Institute of Microelectronics, Chinese Academy of Sciences
- Reticle-like sensing assembly22 Sep 2026US 12,743,018 B2Microprogram Information Co., Ltd.
- Photomask including line pattern monitoring mark and method of manufacturing integrated circuit device using the same18 Aug 2026US 12,710,693 B2Samsung Electronics Co., Ltd.
- Substrate for mask blanks and method for manufacturing the same11 Aug 2026US 12,704,776 B2Shin-Etsu Chemical Co., Ltd.
- Exposure mask16 Jun 2026US 12,656,672 B2VisEra Technologies Company Limited
- Photomask and manufacturing method of the photomask2 Jul 2026US 2026/0186420 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Reflective mask blank and method for manufacturing the same9 Apr 2026US 2026/0099088 A1Shin-Etsu Chemical Co., Ltd.
- Photomask, method of fabricating the photomask and method of manufacturing display device12 Mar 2026US 2026/0072342 A1Samsung Display Co., Ltd.
- Shutter apparatus for a lithography apparatus and/or a mask test apparatus and lithography apparatus/mask test apparatus26 Feb 2026US 2026/0056480 A1
- Copper pillar co-planarity using digital lithography12 Feb 2026US 2026/0044069 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Optical focus phase shift test pattern, monitoring system and process127US 5,300,786 AInternational Business Machines Corporation · 1994
- Measurement structure in a standard cell for controlling process parameters during manufacturing of an integrated circuit83US 7,930,660 B2Infineon Technologies AG · 2011
- Overlay error determination mark considering influence of aberration75US 6,165,656 AMitsubishi Denki Kabushiki Kaisha · 2000
- Verification photomask63US 6,824,931 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2004
- Reticle design inspection system59US 6,466,314 B1APPLIED Materials.Inc. · 2002