Verification photomask
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsKun-Yi Liu, Ching-Ming Chen, Chin-Chuan Hsieh
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Abstract
A verification photomask disclosed. The mask may be for process window verification purposes when switching between fabrication equipment, and/or for optical proximity correction (OPC) verification purposes. The mask includes device areas that are separated by scribe lines. One or more verification patterns are integrated into the scribe lines for verification purposes. These patterns can include: proximity patterns, photoresist-spacing patterns, polysilicon end cap patterns, as well as other patterns. A method for making the mask, and a semiconductor device created at least in part by a method including use of the mask, are also disclosed.
Claims15
A photomask for semiconductor photolithography processing comprising:
- a plurality of device areas;
- a plurality of scribe lines separating the plurality of device areas;
- and,
- one or more verification patterns integrated into the plurality of scribe lines for at least one of process window and optical proximity correction (OPC) verification purposes,
- wherein each verification pattern comprises a complete representative memory cell of memory cell within the plurality of device areas.
A method for producing a photomask comprising:
- creating a plurality of scribe lines on the photomask to define a plurality of device areas on the photomask;
- and,
- creating one or more verification patterns into the plurality of scribe lines on the photomask, each verification pattern comprising a complete representative memory cell of memory cells within the plurality of device areas.
Dependencies are inferred from the claim text.