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US 12,656,672 B2Granted
Exposure mask
AssigneeVisEra Technologies Company Limited
InventorsYueh-Ching Cheng, Linya Tseng, Jyun-You Lu
Life of this patent
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Abstract
An exposure mask is provided. The exposure mask includes a plurality of pattern blocks for defining a plurality of pattern profiles. Each pattern block includes a plurality of pattern units having mask patterns, and the mask patterns are formed in an asymmetric arrangement. The exposure mask may be a binary exposure mask for forming pattern profiles with curved surfaces.
Claims15
An exposure mask, comprising:
- a plurality of pattern blocks for defining a plurality of pattern profiles,
- wherein each of the plurality of pattern blocks comprises a plurality of pattern units having mask patterns, the mask patterns are formed in an asymmetric arrangement, a thickness of each of the plurality of pattern blocks is constant, the mask patterns have different shapes, and the different shapes comprise at least two of a rectangle, a diamond, a dart, and a frame.
Dependencies are inferred from the claim text.