C30B 25/08
Reaction chambers
Official title: Reaction chambers; Selection of materials therefor
C30B25/08 (Reaction chambers) appears on 284 US grants and 395 published applications in this corpus.
Search patents in C30B- Granted patents
- 284
- Published applications
- 395
- Assignees
- 197
- Inventors
- 994
- Latest grant
- 4 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 2 | 0 |
| 1978 | 0 | 0 |
| 1979 | 3 | 0 |
| 1980 | 0 | 0 |
| 1981 | 2 | 0 |
| 1982 | 5 | 0 |
| 1983 | 2 | 0 |
| 1984 | 1 | 0 |
| 1985 | 2 | 0 |
| 1986 | 6 | 0 |
| 1987 | 3 | 0 |
| 1988 | 1 | 0 |
| 1989 | 2 | 0 |
| 1990 | 2 | 0 |
| 1991 | 2 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 2 | 0 |
| 1995 | 4 | 0 |
| 1996 | 0 | 0 |
| 1997 | 3 | 0 |
| 1998 | 4 | 0 |
| 1999 | 6 | 0 |
| 2000 | 10 | 0 |
| 2001 | 12 | 9 |
| 2002 | 7 | 13 |
| 2003 | 9 | 8 |
| 2004 | 5 | 4 |
| 2005 | 7 | 6 |
| 2006 | 5 | 7 |
| 2007 | 1 | 4 |
| 2008 | 3 | 8 |
| 2009 | 2 | 14 |
| 2010 | 4 | 7 |
| 2011 | 4 | 15 |
| 2012 | 5 | 14 |
| 2013 | 8 | 13 |
| 2014 | 9 | 27 |
| 2015 | 8 | 23 |
| 2016 | 11 | 25 |
| 2017 | 12 | 9 |
| 2018 | 13 | 15 |
| 2019 | 10 | 11 |
| 2020 | 11 | 19 |
| 2021 | 11 | 17 |
| 2022 | 13 | 18 |
| 2023 | 12 | 15 |
| 2024 | 14 | 37 |
| 2025 | 16 | 34 |
| 2026 | 8 | 23 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Highly reflective metallic alloys for components of semiconductor processing equipment, and related methods4 Aug 2026US 12,698,570 B2APPLIED Materials.Inc.
- Semiconductor processing chamber, semiconductor processing equipment and vapor epitaxy equipment4 Aug 2026US 12,698,571 B2Advanced Micro-Fabrication Equipment Inc. China
- Chemical vapor deposition reactor in polysilicon production process7 Apr 2026US 12,595,589 B2Advanced Material Solutions, LLC
- Batch mode silicon carbide epitaxial reactor24 Mar 2026US 12,584,241 B2ThinSiC Inc.
- System and methods for a radiant heat cap in a semiconductor wafer reactor17 Mar 2026US 12,581,571 B2GlobalWafers Co., Ltd.
- Device and method for mist chemical vapor deposition of large-size semiconductor thin film8 Oct 2026US 2026/0308759 A1Tiangong University
- Dynamic Seal Deposition Apparatus for Epitaxy8 Oct 2026US 2026/0308803 A1Atomic Nano Materials and Equipment Co., Ltd.
- Method and apparatus for suppression of defects during gallium oxide epitaxy8 Oct 2026US 2026/0308804 A1Kyma Technologies, Inc.
- Systems, methods, and computer program products for substrate processing1 Oct 2026US 2026/0297804 A1ASM IP Holding B. V.
- Method and Device for Producing a SiC Solid Material10 Sep 2026US 2026/0265951 A1
Most cited
By later US patents
- Apparatus for growing thin films784US 5,855,680 ANeste Oy · 1999
- Induction heated pancake epitaxial reactor616US 5,062,386 AEpitaxy Systems, Inc. · 1991
- Induction heated reactor system for chemical vapor deposition519US 4,579,080 AAPPLIED Materials.Inc. · 1986
- Vertical furnace for the treatment of semiconductor substrates395US 6,225,602 B1Advanced Semiconductor Materials International, N.V. · 2001
- Staggered ribs on process chamber to reduce thermal effects395US 7,108,753 B2ASM America, Inc. · 2006