Staggered ribs on process chamber to reduce thermal effects
AssigneeASM America, Inc.
InventorEric R. Wood
Life of this patent
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AssigneeASM America, Inc.
InventorEric R. Wood
Estimating the term…
A semiconductor processing chamber having a plurality of ribs on an exterior surface of the chamber is provided. The ribs are positioned relative to the chamber such that shadows cast into the chamber by the ribs are offset from one another, thus more uniformly distributing radiant energy entering the chamber. In one embodiment, the ribs are positioned on the exterior surface of the chamber so that they have dissimilar radial distances from a center of the chamber. When a substrate rotates within the chamber, shadows produced by the ribs on a first side of the chamber fall substantially between secondary shadows produced by the ribs on a second side of the chamber. Likewise, shadows produced by the ribs on the second side of the chamber fall substantially between the secondary shadows produced by the ribs on the first side of the chamber.
A chamber, comprising:
A reaction chamber, comprising:
A reaction chamber, comprising:
Dependencies are inferred from the claim text.