Chemical vapor deposition reactor in polysilicon production process
AssigneeAdvanced Material Solutions, LLC
InventorsChad Fero, David Keck
Life of this patent
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Abstract
A chemical vapor deposition reactor that increases the yield of polysilicon in a polysilicon manufacturing process is presented in this disclosure. A chemical vapor deposition reactor may include a heat transfer jacket that protrudes at an upper end as much as or more than the top end of a filament to reflect radiant heat back to a filament or polysilicon rod. The heat transfer jacket may be used to control the temperature difference on the filament or polysilicon to prevent cracks in the polysilicon to increase the yield of the polysilicon in the polysilicon manufacturing process.
Claims16
A chemical vapor deposition reactor in a polysilicon production process, the reactor comprising:
- at least one reaction chamber;
- at least one pair of electrodes extending into the at least one reaction chamber;
- at least one filament, wherein the at least one filament comprises a pair of vertical portions and a bridge connecting tops of the pair of vertical portions horizontally, and wherein bottoms of the pair of vertical portions are respectively connected to the at least one pair of electrodes, and wherein the at least one filament is heated by an electric current applied through the at least one pair of electrodes;
- and
- at least one heat transfer jacket surrounding the pair of vertical portions of the at least one filament, each heat transfer jacket including a double wall, wherein the double wall includes a space to contain a heat transfer medium therein,
- wherein a surface of the double wall facing the at least one filament includes a reflective surface reflecting radiant heat emitted from the at least one filament to the at least one filament, and
- wherein at least a portion of an upper end of the at least one heat transfer jacket extends at least higher than a bottom of the bridge to reflect radiant heat to the at least one filament, and another portion of the upper end of the same at least one heat transfer jacket is located below the bridge.
A chemical vapor deposition reactor comprising:
- a reaction chamber;
- a first electrode and a second electrode, wherein the first electrode and the second electrode extend into the reaction chamber;
- a filament including a first vertical portion, a second vertical portion, and a bridge connecting a top of a first vertical portion to a top of the second vertical portion horizontally, wherein the first vertical portion has a bottom connected to the first electrode and the second vertical portion has a bottom connected to the second electrode, and the filament is heated by an electric current applied through the first electrode and the second electrode;
- and
- at least one heat transfer jacket surrounding both the first vertical portion and the second vertical portion of the filament and including a double wall, wherein the double wall includes a space to contain a heat transfer medium therein, wherein the double wall has a surface facing the filament, and the surface facing the filament includes a reflective surface reflecting radiant heat emitted from the filament toward the filament,
- wherein at least a portion of an upper end of the at least one heat transfer jacket extends at least higher than a bottom of the bridge to reflect radiant heat to the filament, and another portion of the upper end of the same at least one heat transfer jacket is located below the bridge.
Dependencies are inferred from the claim text.