C23C 16/45576
Coaxial inlets for each gas
Official title: {Coaxial inlets for each gas}
C23C16/45576 (Coaxial inlets for each gas) appears on 108 US grants and 118 published applications in this corpus.
Search patents in C23C- Granted patents
- 108
- Published applications
- 118
- Assignees
- 104
- Inventors
- 344
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 2 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 1 | 0 |
| 1982 | 5 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 2 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 4 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 2 | 0 |
| 1996 | 0 | 0 |
| 1997 | 2 | 0 |
| 1998 | 2 | 0 |
| 1999 | 3 | 0 |
| 2000 | 7 | 0 |
| 2001 | 4 | 1 |
| 2002 | 6 | 4 |
| 2003 | 1 | 4 |
| 2004 | 5 | 0 |
| 2005 | 2 | 3 |
| 2006 | 1 | 0 |
| 2007 | 1 | 3 |
| 2008 | 2 | 3 |
| 2009 | 1 | 6 |
| 2010 | 0 | 3 |
| 2011 | 2 | 4 |
| 2012 | 0 | 11 |
| 2013 | 1 | 3 |
| 2014 | 2 | 1 |
| 2015 | 6 | 6 |
| 2016 | 5 | 5 |
| 2017 | 3 | 6 |
| 2018 | 2 | 8 |
| 2019 | 3 | 3 |
| 2020 | 3 | 4 |
| 2021 | 3 | 5 |
| 2022 | 2 | 12 |
| 2023 | 8 | 12 |
| 2024 | 4 | 4 |
| 2025 | 4 | 6 |
| 2026 | 3 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Substrate processing method and apparatus22 Sep 2026US 12,745,611 B2ASM IP Holding B. V.
- Wall-cooled gas-inlet element for a CVD reactor28 Jul 2026US 12,692,602 B2Aixtron SE
- Gas inlet device for a CVD reactor14 Jul 2026US 12,680,166 B2Aixtron SE
- Manifolds for uniform vapor deposition16 Sep 2025US 12,416,081 B2ASM IP Holding B. V.
- Targeted temporal ALD8 Jul 2025US 12,351,912 B2Microsoft Technology Licensing, LLC
- Co-jet nozzle assembly and anomaly detection2 Apr 2026US 2026/0092372 A1
- Manifolds for uniform vapor deposition27 Nov 2025US 2025/0361611 A1ASM IP Holding B. V.
- Epitaxial growth apparatus for silicon carbide semiconductor11 Sep 2025US 2025/0283248 A1Denso Corporation
- Substrate processing apparatus, nozzle, method of processing substrate, method of manufacturing semiconductor device, and recording medium3 Jul 2025US 2025/0215567 A1Kokusai Electric Corporation
- Device for Performing Plasma Treatment, and Method for Performing Plasma Treatment12 Jun 2025US 2025/0188610 A1Tokyo Electron Limited
Most cited
By later US patents
- Programmable multizone gas injector for single-wafer semiconductor processing equipment740US 5,453,124 ATexas Instruments Incorporated · 1995
- Induction heated pancake epitaxial reactor616US 5,062,386 AEpitaxy Systems, Inc. · 1991
- Pulsed valve manifold for atomic layer deposition496US 9,574,268 B1ASM America, Inc. · 2017
- Showerhead for film depositing vacuum equipment492US 9,315,897 B2Korea Institute of Industrial Technology · 2016
- Tapered post, showerhead design to improve mixing on dual plenum showerheads474US 6,883,733 B1Novellus Systems, Inc. · 2005