Gas inlet device for a CVD reactor

A gas distribution device, comprising:

• a plurality of gas inlet regions (E1 to E5), which are arranged on top of one another and from which process gases or a carrier gas are introduced into a process chamber (7) of a chemical vapor deposition (CVD) reactor;
• a plurality of supply conduits (18);
• at least five gas outlet zones (Z1 to Z12) that are arranged on top of one another and respectively have a gas distribution volume (17), into which one of the supply conduits (18) for introducing a gas flow leads, wherein adjacent gas distribution volumes (17, 17′, 17″) are separated from one another by a base (14), wherein each of the gas distribution volumes (17) has a gas outlet wall (11) with gas outlet openings (12), and wherein each of the gas inlet regions (E1 to E5) are formed by adjacent ones of the gas outlet walls (11);
• and
• a matrix style gas mixing system comprising a plurality of gas conduits (L1 to L12) and a plurality of feed conduits (G1 to G4), wherein each of the supply conduits (18) is connected to one of the gas conduits (L1 to L12) of the matrix style gas mixing system, wherein each of the feed conduits (G1 to G4) is connected to a source of a process gas or an inert gas, wherein every one of the feed conduits (G1 to G4) intersects every one of the gas conduits (L1 to L12), and wherein at every intersection point between a respective one of the feed conduits (G1 to G4) and a respective one of the gas conduits (L1 to L12) a valve (20) is disposed.