C23C 16/045
Coating cavities or hollow spaces
Official title: {Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates}
C23C16/045 (Coating cavities or hollow spaces) appears on 1,984 US grants and 2,655 published applications in this corpus.
Search patents in C23C- Granted patents
- 1,984
- Published applications
- 2,655
- Assignees
- 627
- Inventors
- 4,746
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 3 | 0 |
| 1977 | 1 | 0 |
| 1978 | 3 | 0 |
| 1979 | 3 | 0 |
| 1980 | 3 | 0 |
| 1981 | 3 | 0 |
| 1982 | 1 | 0 |
| 1983 | 3 | 0 |
| 1984 | 1 | 0 |
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 3 | 0 |
| 1988 | 4 | 0 |
| 1989 | 3 | 0 |
| 1990 | 3 | 0 |
| 1991 | 5 | 0 |
| 1992 | 8 | 0 |
| 1993 | 13 | 0 |
| 1994 | 23 | 0 |
| 1995 | 22 | 0 |
| 1996 | 16 | 0 |
| 1997 | 18 | 0 |
| 1998 | 22 | 0 |
| 1999 | 27 | 0 |
| 2000 | 43 | 0 |
| 2001 | 36 | 14 |
| 2002 | 40 | 35 |
| 2003 | 34 | 58 |
| 2004 | 40 | 55 |
| 2005 | 35 | 67 |
| 2006 | 27 | 67 |
| 2007 | 34 | 53 |
| 2008 | 24 | 60 |
| 2009 | 37 | 58 |
| 2010 | 43 | 46 |
| 2011 | 52 | 39 |
| 2012 | 29 | 61 |
| 2013 | 47 | 61 |
| 2014 | 38 | 70 |
| 2015 | 44 | 84 |
| 2016 | 51 | 91 |
| 2017 | 73 | 115 |
| 2018 | 92 | 137 |
| 2019 | 119 | 155 |
| 2020 | 119 | 159 |
| 2021 | 99 | 133 |
| 2022 | 106 | 213 |
| 2023 | 119 | 223 |
| 2024 | 148 | 208 |
| 2025 | 171 | 250 |
| 2026 | 94 | 143 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Filling method and film forming apparatus6 Oct 2026US 12,753,491 B2Tokyo Electron Limited
- Method for functionalizing a polymer-based substrate by chemical deposition of a thin layer29 Sep 2026US 12,747,495 B2Centre National De La Recherche Scientifique
- Acoustic wave assisted chemical vapor iinfiltration1 Sep 2026US 12,723,306 B2Rtx Corporation
- Coating interior surfaces of complex bodies by atomic layer deposition25 Aug 2026US 12,716,128 B2APPLIED Materials.Inc.
- Measurement method and substrate processing apparatus25 Aug 2026US 12,716,840 B2Tokyo Electron Limited
- Process for manufacturing a silicon carbide coated body8 Oct 2026US 2026/0308754 A1APPLIED Materials.Inc.
- Topology-selective deposition method and structure formed using same1 Oct 2026US 2026/0297730 A1ASM IP Holding B. V.
- A method for operating a chemical vapor deposition process1 Oct 2026US 2026/0297751 A1Canatu Finland Oy
- Transparent mesoporous materials and devices comprising same24 Sep 2026US 2026/0286509 A1The Regents of the University of Michigan
- Using Polypeptoids for Deposition and Area-Selective Deposition of Metal Oxides24 Sep 2026US 2026/0286512 A1The Regents of the University of California
Most cited
By later US patents
- Production of elemental thin films using a boron-containing reducing agent809US 6,475,276 B1ASM Microchemistry Oy · 2002
- Method and system for improving dielectric film quality for void free gap fill649US 7,541,297 B2APPLIED Materials.Inc. · 2009
- Method of forming conformal dielectric film having Si-N bonds by PECVD603US 7,919,416 B2ASM Japan K .K. · 2011
- Method of forming conformal film having si-N bonds on high-aspect ratio pattern597US 8,394,466 B2ASM Japan K .K. · 2013
- Conformal doping via plasma activated atomic layer deposition and conformal film deposition594US 8,956,983 B2Novellus Systems, Inc. · 2015