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US 12,716,840 B2Granted
Measurement method and substrate processing apparatus
AssigneeTokyo Electron Limited
InventorYuji Otsuki
Life of this patent
Estimating the term…
Abstract
A measurement method includes: a first measurement step of irradiating a prism with infrared light and measuring reflected light totally reflected by the prism; a second measurement step of irradiating the prism with infrared light while the prism is arranged on a substrate and measuring reflected light totally reflected by a surface of the prism on the substrate; and a calculation step of calculating an absorbance spectrum from an intensity spectrum of infrared light for each wave number of the reflected light measured in the first measurement step and an intensity spectrum of infrared light for each wave number of the reflected light measured in the second measurement step.
Claims16
A measurement method, comprising:
- a first measurement step of irradiating a prism with infrared light and measuring reflected light totally reflected by the prism;
- a second measurement step of irradiating the prism with infrared light while the prism is arranged on a substrate and measuring reflected light totally reflected by a surface of the prism on the substrate;
- and
- a calculation step of calculating an absorbance spectrum from an intensity spectrum of infrared light for each wave number of the reflected light measured in the first measurement step and an intensity spectrum of infrared light for each wave number of the reflected light measured in the second measurement step,
- wherein in the first measurement step and the second measurement step, each of a plurality of substrates on which recesses having a same shape are formed at different densities is measured,
- wherein in the calculation step, for each of the plurality of substrates, the absorbance spectrum is calculated from the intensity spectrum of infrared light for each wave number of the reflected light measured in the first measurement step and the intensity spectrum of infrared light for each wave number of the reflected light measured in the second measurement step, and
- wherein the measurement method further comprises:
- an analysis step of analyzing depth dependence based on the absorbance spectrum for each of the plurality of substrates calculated in the calculation step.
5 more elements
A measurement method, comprising:
- a first measurement step of irradiating a prism with infrared light and measuring reflected light totally reflected by the prism;
- a second measurement step of irradiating the prism with infrared light while the prism is arranged on a substrate and measuring reflected light totally reflected by a surface of the prism on the substrate;
- a calculation step of calculating an absorbance spectrum from an intensity spectrum of infrared light for each wave number of the reflected light measured in the first measurement step and an intensity spectrum of infrared light for each wave number of the reflected light measured in the second measurement step;
- and
- a substrate processing step of performing a substrate processing on the substrate,
- wherein in the first measurement step, only the prism is irradiated with infrared light, and an intensity of reflected light totally reflected by the prism is measured, and
- wherein in the second measurement step, the prism is irradiated with infrared light while the prism is arranged on the substrate after the substrate processing, and an intensity of reflected light totally reflected at an interface between the substrate and the prism is measured.
4 more elements
A substrate processing apparatus, comprising:
- a stage configured to mount a substrate;
- a substrate processor configured to perform a substrate processing on the substrate;
- a measurer configured to irradiate a prism arranged on the substrate with infrared light and measure an intensity of reflected light totally reflected on a surface of the prism on the substrate;
- and
- a controller configured perform a control including:
- causing the measurer to irradiate the substrate before the substrate processing with infrared light and measure reflected light totally reflected on the surface of the prism on the substrate;
- causing the substrate processor to perform the substrate processing on the substrate;
- causing the measurer to irradiate the substrate after the substrate processing with infrared light and measure reflected light totally reflected on the surface of the prism on the substrate;
- and
- calculating an absorbance spectrum from an intensity spectrum of infrared light for each wave number of the measured reflected light before the substrate processing and an intensity spectrum of infrared light for each wave number of the measured reflected light after the substrate processing.
7 more elements
Dependencies are inferred from the claim text.