C23C 14/564
Means for minimising impurities in the coating chamber such as dust, moisture
Official title: {Means for minimising impurities in the coating chamber such as dust, moisture, residual gases}
C23C14/564 (Means for minimising impurities in the coating chamber such as dust, moisture) appears on 1,285 US grants and 1,401 published applications in this corpus.
Search patents in C23C- Granted patents
- 1,285
- Published applications
- 1,401
- Assignees
- 543
- Inventors
- 3,202
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 6 | 0 |
| 1977 | 5 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 4 | 0 |
| 1981 | 4 | 0 |
| 1982 | 1 | 0 |
| 1983 | 5 | 0 |
| 1984 | 4 | 0 |
| 1985 | 7 | 0 |
| 1986 | 1 | 0 |
| 1987 | 3 | 0 |
| 1988 | 3 | 0 |
| 1989 | 7 | 0 |
| 1990 | 10 | 0 |
| 1991 | 10 | 0 |
| 1992 | 11 | 0 |
| 1993 | 16 | 0 |
| 1994 | 20 | 0 |
| 1995 | 22 | 0 |
| 1996 | 27 | 0 |
| 1997 | 34 | 0 |
| 1998 | 31 | 0 |
| 1999 | 42 | 0 |
| 2000 | 64 | 0 |
| 2001 | 61 | 40 |
| 2002 | 63 | 48 |
| 2003 | 48 | 57 |
| 2004 | 46 | 64 |
| 2005 | 33 | 51 |
| 2006 | 18 | 58 |
| 2007 | 16 | 48 |
| 2008 | 14 | 57 |
| 2009 | 22 | 57 |
| 2010 | 29 | 57 |
| 2011 | 29 | 72 |
| 2012 | 30 | 51 |
| 2013 | 33 | 67 |
| 2014 | 47 | 79 |
| 2015 | 47 | 54 |
| 2016 | 42 | 45 |
| 2017 | 39 | 65 |
| 2018 | 50 | 51 |
| 2019 | 25 | 42 |
| 2020 | 38 | 48 |
| 2021 | 26 | 65 |
| 2022 | 43 | 62 |
| 2023 | 45 | 49 |
| 2024 | 47 | 55 |
| 2025 | 39 | 34 |
| 2026 | 18 | 25 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Structures and methods for processing a semiconductor substrate22 Sep 2026US 12,742,237 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Particle reduction in physical vapor deposition of amorphous silicon1 Sep 2026US 12,723,304 B2APPLIED Materials.Inc.
- Shutter disk system1 Sep 2026US 12,723,305 B2APPLIED Materials.Inc.
- Air bearing shaft with wide operating temperature range11 Aug 2026US 12,706,271 B2APPLIED Materials.Inc.
- Iron nitride magnetic material including coated nanoparticles5 May 2026US 12,620,511 B2Regents of the University of Minnesota
- Tco coating method, tco coating device, and solar cell and preparation method therefor8 Oct 2026US 2026/0314105 A1Tongwei Solar (Chengdu) Co., Ltd.
- Degassing method, degassing chamber, and semiconductor processing apparatus20 Aug 2026US 2026/0242931 A1Beijing Naura Microelectronics Equipment Co., Ltd.
- Iron nitride magnetic material including coated nanoparticles6 Aug 2026US 2026/0229392 A1Regents of the University of Minnesota
- Apparatus For Depositing Material Layers on a Substrate23 Jul 2026US 2026/0209932 A1
- Substrate processing apparatus and a substrate processing method16 Jul 2026US 2026/0201545 A1Tokyo Electron Limited
Most cited
By later US patents
- Film forming apparatus capable of preventing adhesion of film deposits590US 5,065,698 ACanon Kabushiki Kaisha · 1991
- Perimeter partition-valve with protected seals and associated small size process chambers and multiple chamber systems529US 7,682,454 B2Sundew Technologies, LLC · 2010
- Method for processing semi-conductor wafers in a multiple vacuum and non-vacuum chamber apparatus433US 5,310,410 ASputtered Films, Inc. · 1994
- Closed loop residual gas analyzer process control technique406US 6,955,928 B1Advanced Micro Devices, Inc. · 2005
- Barrier formation using novel sputter deposition method with PVD, CVD, or ALD386US 6,740,585 B2APPLIED Materials.Inc. · 2004