C23C 14/566
Using a load-lock chamber
Official title: {using a load-lock chamber}
C23C14/566 (Using a load-lock chamber) appears on 320 US grants and 289 published applications in this corpus.
Search patents in C23C- Granted patents
- 320
- Published applications
- 289
- Assignees
- 176
- Inventors
- 853
- Latest grant
- 1 Sep 2026
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| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 3 | 0 |
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 1 | 0 |
| 1982 | 1 | 0 |
| 1983 | 3 | 0 |
| 1984 | 2 | 0 |
| 1985 | 6 | 0 |
| 1986 | 0 | 0 |
| 1987 | 3 | 0 |
| 1988 | 1 | 0 |
| 1989 | 4 | 0 |
| 1990 | 4 | 0 |
| 1991 | 3 | 0 |
| 1992 | 3 | 0 |
| 1993 | 5 | 0 |
| 1994 | 5 | 0 |
| 1995 | 6 | 0 |
| 1996 | 7 | 0 |
| 1997 | 8 | 0 |
| 1998 | 9 | 0 |
| 1999 | 20 | 0 |
| 2000 | 21 | 0 |
| 2001 | 17 | 7 |
| 2002 | 15 | 12 |
| 2003 | 10 | 13 |
| 2004 | 8 | 17 |
| 2005 | 7 | 9 |
| 2006 | 7 | 9 |
| 2007 | 2 | 13 |
| 2008 | 3 | 9 |
| 2009 | 3 | 7 |
| 2010 | 8 | 11 |
| 2011 | 7 | 7 |
| 2012 | 4 | 8 |
| 2013 | 4 | 5 |
| 2014 | 4 | 10 |
| 2015 | 7 | 8 |
| 2016 | 8 | 17 |
| 2017 | 5 | 17 |
| 2018 | 14 | 16 |
| 2019 | 7 | 12 |
| 2020 | 11 | 14 |
| 2021 | 8 | 13 |
| 2022 | 8 | 12 |
| 2023 | 11 | 12 |
| 2024 | 10 | 18 |
| 2025 | 7 | 6 |
| 2026 | 8 | 7 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
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- Iron nitride magnetic material including coated nanoparticles6 Aug 2026US 2026/0229392 A1Regents of the University of Minnesota
- Load-lock apparatus16 Jul 2026US 2026/0201561 A1Nissin Ion Equipment Co., Ltd.
- Semiconductor device manufacturing method and semiconductor device manufacturing apparatus18 Jun 2026US 2026/0173829 A1Fuji Electric Co., Ltd.
- System and method for processing substrate16 Apr 2026US 2026/0103791 A1Tokyo Electron Limited
Most cited
By later US patents
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- Method for processing semi-conductor wafers in a multiple vacuum and non-vacuum chamber apparatus433US 5,310,410 ASputtered Films, Inc. · 1994
- Barrier formation using novel sputter deposition method with PVD, CVD, or ALD386US 6,740,585 B2APPLIED Materials.Inc. · 2004
- Catheter having a long-lasting antimicrobial surface treatment148US 5,520,664 ASpire Corporation · 1996
- Apparatus for performing continuous treatment in vacuum115US 4,405,435 AAnelva Corporation · 1983