Tco coating method, tco coating device, and solar cell and preparation method therefor

A TCO coating apparatus, comprising:

• a carrier plate configured to load a workpiece to be coated;
• a first buffer chamber, a first coating chamber, and a second buffer chamber that are arranged in sequence, wherein a TCO coating source is provided in the first coating chamber and configured to perform TCO coating process on the workpiece to be coated on the carrier plate;
• a water vapor partial pressure detecting device configured to detect a water vapor partial pressure in the first coating chamber during the TCO coating process;
• and
• at least one plasma-etching cleaning device provided in at least one of the first buffer chamber and the second buffer chamber, when the water vapor partial pressure detected by the water vapor partial pressure detecting device is greater than 5.0×e−3 Pa, wherein at least one plasma-etching cleaning device is configured to perform ion etching cleaning on the carrier plate to enable the water vapor partial pressure in the first coating chamber to be no greater than 5.0×e−3 Pa.