Film forming apparatus capable of preventing adhesion of film deposits
AssigneeCanon Kabushiki Kaisha
InventorAtsushi Koike
Life of this patent
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Abstract
A film forming apparatus for forming a film on a substrate set inside a film forming chamber capable of being evacuated comprises; a film forming chanber in which a film is formed on a substrate; a deposit shield member to prevent deposits from being adhered on the inner wall surface of the film forming chamber; a vacuum chamber capable of being evacuated and in which the deposit shield member is changed for new one; an open-shut device provided between the vacuum chamber and the film forming chamber, to keep airtightness between the vacuum chamber and the film forming chamber; and a carrying device to carry the deposit shield member between the vacuum chamber and the film forming chamber.
Claims7
A film forming apparatus for forming a film on a substrate set inside at least one film forming chamber capable of being evacuated, comprising;
- said film forming chamber in which the film is formed on said substrate;
- a deposit shield member to prevent deposits from being adhered on the inner wall surface of said film forming chamber, said deposit shield member subject to absorption of gas on surfaces thereof;
- at least one vacuum chamber capable of being evacuated and in which said deposit shield member is changed for a new one, wherein said vacuum chamber includes a baking means to enhance elimination of gas absorbed on said surface of said deposit shield member;
- an open-shut means provided between said vacuum chamber and said film forming chamber, to keep airtightness between said vacuum chamber and said film forming chamber;
- and
- a carrying means to carry said deposit shield member between said vacuum chamber and said film forming chamber.
Dependencies are inferred from the claim text.