C23C 14/3428
Using liquid targets
Official title: {using liquid targets}
C23C14/3428 (Using liquid targets) appears on 14 US grants and 16 published applications in this corpus.
Search patents in C23C- Granted patents
- 14
- Published applications
- 16
- Assignees
- 15
- Inventors
- 45
- Latest grant
- 5 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 1 |
| 2002 | 1 | 1 |
| 2003 | 0 | 0 |
| 2004 | 1 | 0 |
| 2005 | 0 | 1 |
| 2006 | 0 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 0 |
| 2009 | 1 | 2 |
| 2010 | 0 | 0 |
| 2011 | 0 | 0 |
| 2012 | 0 | 1 |
| 2013 | 0 | 1 |
| 2014 | 1 | 1 |
| 2015 | 1 | 1 |
| 2016 | 0 | 0 |
| 2017 | 1 | 1 |
| 2018 | 0 | 0 |
| 2019 | 0 | 1 |
| 2020 | 0 | 1 |
| 2021 | 2 | 2 |
| 2022 | 1 | 0 |
| 2023 | 1 | 1 |
| 2024 | 1 | 0 |
| 2025 | 0 | 1 |
| 2026 | 2 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Substrate processing apparatus and substrate processing method5 May 2026US 12,618,142 B2Tokyo Electron Limited
- Vacuum layer deposition apparatus and method of depositing a layer on a substrate, especially on a substrate comprising indentations in the surface to be coated7 Apr 2026US 12,595,550 B2Evatec AG
- Liquid sputter target9 Apr 2024US 11,952,654 B2Evatec AG
- Advanced sputter targets for ion generation3 Jan 2023US 11,542,594 B2APPLIED Materials.Inc.
- Method of forming a metallic lithium coating5 Apr 2022US 11,296,310 B2Sigma Lithium Limited
- Vacuum layer deposition apparatus and method of depositing a layer on a substrate, especially on a substrate comprising indentations in the surface to be coated12 Jun 2025US 2025/0188594 A1Evatec AG
- Substrate processing apparatus and substrate processing method15 Jun 2023US 2023/0183854 A1Tokyo Electron Limited
- Liquid sputter target9 Dec 2021US 2021/0381099 A1Evatec AG
- Advanced Sputter Targets For Ion Generation5 Aug 2021US 2021/0238732 A1APPLIED Materials.Inc.
- Advanced Sputter Targets For Ion Generation21 May 2020US 2020/0157675 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Non-thermionic sputter material transport device, methods of use, and materials produced thereby33US 6,787,010 B2North Carolina State University · 2004
- Sputter deposition process14US 5,507,931 ADeposition Technologies, Inc. · 1996
- Process for formation of a coating on a substrate4US 6,432,281 B1Recherche et Developpement Due Groupe Cockerill Sambre · 2002
- Method for manufacturing acoustic wave device3US 9,584,088 B2Murata Manufacturing Co., Ltd. · 2017
- Advanced sputter targets for ion generation1US 11,008,649 B2APPLIED Materials.Inc. · 2021