Advanced sputter targets for ion generation
AssigneeApplied Materials, Inc.
InventorsGraham Wright, Klaus Becker
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Abstract
An advanced sputter target is disclosed. The advanced sputter target comprises two components, a porous carrier, and a metal material disposed within that porous carrier. The porous carrier is designed to be a high porosity, open cell structure such that molten material may flow through the carrier. The porous carrier also provides structural support for the metal material. The cell sizes of the porous carrier are dimensioned such that the capillary action and surface tension prohibits the metal material from spilling, dripping, or otherwise exiting the porous carrier. In some embodiments, the porous carrier is an open cell foam, a weave of strands or stacked meshes.
Claims16
A sputter target, consisting of:
- a porous carrier having a plurality of open cells;
- and
- a metal material disposed in the porous carrier;
- wherein dimensions of the plurality of open cells and cell openings in the porous carrier are such that a surface tension. of the metal material when in molten form is sufficient to retain the metal material in the porous carrier against gravity.
Dependencies are inferred from the claim text.