C23C 14/3414
Metallurgical or chemical aspects of target preparation
Official title: {Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy}
C23C14/3414 (Metallurgical or chemical aspects of target preparation) appears on 1,829 US grants and 2,377 published applications in this corpus.
Search patents in C23C- Granted patents
- 1,829
- Published applications
- 2,377
- Assignees
- 660
- Inventors
- 3,667
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 2 | 0 |
| 1979 | 3 | 0 |
| 1980 | 2 | 0 |
| 1981 | 1 | 0 |
| 1982 | 2 | 0 |
| 1983 | 3 | 0 |
| 1984 | 3 | 0 |
| 1985 | 1 | 0 |
| 1986 | 5 | 0 |
| 1987 | 4 | 0 |
| 1988 | 5 | 0 |
| 1989 | 12 | 0 |
| 1990 | 13 | 0 |
| 1991 | 13 | 0 |
| 1992 | 13 | 0 |
| 1993 | 14 | 0 |
| 1994 | 15 | 0 |
| 1995 | 35 | 0 |
| 1996 | 17 | 0 |
| 1997 | 16 | 0 |
| 1998 | 32 | 0 |
| 1999 | 31 | 0 |
| 2000 | 36 | 0 |
| 2001 | 43 | 19 |
| 2002 | 49 | 74 |
| 2003 | 53 | 55 |
| 2004 | 52 | 91 |
| 2005 | 37 | 78 |
| 2006 | 29 | 86 |
| 2007 | 27 | 105 |
| 2008 | 29 | 82 |
| 2009 | 50 | 156 |
| 2010 | 65 | 98 |
| 2011 | 67 | 135 |
| 2012 | 70 | 139 |
| 2013 | 74 | 145 |
| 2014 | 78 | 135 |
| 2015 | 100 | 131 |
| 2016 | 91 | 122 |
| 2017 | 88 | 101 |
| 2018 | 106 | 86 |
| 2019 | 74 | 74 |
| 2020 | 69 | 86 |
| 2021 | 56 | 81 |
| 2022 | 44 | 63 |
| 2023 | 64 | 64 |
| 2024 | 52 | 70 |
| 2025 | 50 | 60 |
| 2026 | 33 | 41 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Metal-Si based powder, method for producing same, metal-Si based sintered body, sputtering target, and metal-Si based thin film manufacturing method15 Sep 2026US 12,734,577 B2Tosoh Corporation
- Methods of making nanopowders, nanoceramic materials and nanoceramic components15 Sep 2026US 12,735,363 B2APPLIED Materials.Inc.
- High-entropy alloy coating material and its manufacturing method1 Sep 2026US 12,723,300 B2INNOTION TECH Co., Ltd.
- Strain resistance film, physical quantity sensor, and method for manufacturing the strain resistance film18 Aug 2026US 12,709,787 B2TDK Corporation
- Variable hardness nanocomposite coating18 Aug 2026US 12,709,794 B2Southwest Research Institute
- Wnix sputtering target8 Oct 2026US 2026/0308747 A1Plansee SE
- Al-sc alloys and sputtering targets and processes for consolidating1 Oct 2026US 2026/0297723 A1Materion Corporation
- Molybdenum target and method for producing the same1 Oct 2026US 2026/0297724 A1Ulvac, Inc.
- Target assembly and method for manufacturing target assembly24 Sep 2026US 2026/0286506 A1Ulvac, Inc.
- Sputtering with good compositional uniformity17 Sep 2026US 2026/0275492 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Method of making an analyte sensor280US 7,882,611 B2Medtronic MiniMed, Inc. · 2011
- Sputtering of lithium229US 6,039,850 AMinnesota Mining and Manufacturing Company · 2000
- Sputtering target, method of producing the target, optical recording medium fabricated by using the sputtering target, and method of fabricating the optical recording medium220US 6,280,684 B1Ricoh Company, Ltd. · 2001
- Thin-film solar cells205US 6,974,976 B2Miasole · 2005
- Noncrystalline oxide semiconductor thin film, process for producing the noncrystalline oxide semiconductor thin film, process for producing thin-film transistor, field-effect-transistor, light emitting device, display device, and sputtering target123US 8,232,552 B2Idemitsu Kosan Co., Ltd. · 2012