C11D 7/34
Containing sulfur
Official title: containing sulfur
C11D7/34 (Containing sulfur) appears on 347 US grants and 375 published applications in this corpus.
Search patents in C11D- Granted patents
- 347
- Published applications
- 375
- Assignees
- 182
- Inventors
- 790
- Latest grant
- 13 Jan 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 2 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 2 | 0 |
| 1984 | 3 | 0 |
| 1985 | 0 | 0 |
| 1986 | 2 | 0 |
| 1987 | 2 | 0 |
| 1988 | 1 | 0 |
| 1989 | 2 | 0 |
| 1990 | 2 | 0 |
| 1991 | 1 | 0 |
| 1992 | 2 | 0 |
| 1993 | 0 | 0 |
| 1994 | 4 | 0 |
| 1995 | 2 | 0 |
| 1996 | 7 | 0 |
| 1997 | 7 | 0 |
| 1998 | 5 | 0 |
| 1999 | 11 | 0 |
| 2000 | 13 | 0 |
| 2001 | 17 | 4 |
| 2002 | 15 | 19 |
| 2003 | 13 | 16 |
| 2004 | 6 | 19 |
| 2005 | 6 | 19 |
| 2006 | 7 | 22 |
| 2007 | 8 | 16 |
| 2008 | 11 | 12 |
| 2009 | 13 | 16 |
| 2010 | 11 | 22 |
| 2011 | 10 | 16 |
| 2012 | 17 | 12 |
| 2013 | 12 | 15 |
| 2014 | 14 | 7 |
| 2015 | 14 | 17 |
| 2016 | 11 | 16 |
| 2017 | 11 | 12 |
| 2018 | 10 | 10 |
| 2019 | 7 | 19 |
| 2020 | 9 | 16 |
| 2021 | 20 | 9 |
| 2022 | 12 | 17 |
| 2023 | 6 | 12 |
| 2024 | 9 | 12 |
| 2025 | 7 | 13 |
| 2026 | 1 | 7 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Process solution for polymer processing13 Jan 2026US 12,525,445 B2Dongwoo Fine-Chem Co., Ltd.
- Process solution composition for polymer treatment comprising a fluorine compound, a ketone solvent, and a polar aprotic solvent30 Dec 2025US 12,509,598 B2Dongwoo Fine-Chem Co., Ltd.
- Film cleaning solution and method for cleaning film2 Dec 2025US 12,485,387 B2Tokyo Ohka Kogyo.Co., Ltd.
- Treatment liquid, method for washing substrate, and method for removing resist25 Nov 2025US 12,481,218 B2FUJIFILM Corporation
- Anti-staining agent27 May 2025US 12,312,558 B2Kao Corporation
- Enzymatic cleaner for an automated clinical analyzer and methods of use thereof13 Aug 2026US 2026/0234511 A1Siemens Healthcare Diagnostics Inc.
- Substrate treatment solution16 Jul 2026US 2026/0201281 A1Merck Patent GmbH
- Semiconductor substrate processing liquid18 Jun 2026US 2026/0167902 A1Kao Corporation
- Semiconductor treatment liquid, treatment method for object to be treated, and manufacturing method of electronic device30 Apr 2026US 2026/0117148 A1FUJIFILM Corporation
- Cleaning composition2 Apr 2026US 2026/0092239 A1Dongwoo Fine-Chem Co., Ltd.
Most cited
By later US patents
- Cleaning compositions for removing etching residue and method of using150US 5,334,332 AEKC Technology, Inc. · 1994
- Post clean treatment composition comprising an organic acid and hydroxylamine137US 5,981,454 AEKC Technology, Inc. · 1999
- Stripping composition and method of using the same114US 4,617,251 AOlin Hunt Specialty Products Inc. · 1986
- Stripping compositions comprising hydroxylamine and alkanolamine89US 5,279,771 AEKC Technology, Inc. · 1994
- Aqueous degreaser compositions containing an organic solvent and a solubilizing coupler85US 5,080,822 ABuckeye International, Inc. · 1992