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US 12,485,387 B2Granted
Film cleaning solution and method for cleaning film
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorIsao Hirano
Life of this patent
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Abstract
A film cleaning solution that contains a solvent and a metal removing agent, in which two or more kinds of the solvents are contained, and a distance between a Hansen solubility parameter of the film cleaning solution and a Hansen solubility parameter of dimethylacetamide is 1.0 or less.
Claims10
A film cleaning solution consisting of:
- a solvent;
- and
- a metal removing agent,
- wherein the film cleaning solution contains γ-butyrolactone and solvents other than γ-butyrolactone,
- the metal removing agent contains at least one selected from the group consisting of a metal chelating agent and an organic acid, and
- a distance between a Hansen solubility parameter of the film cleaning solution and a Hansen solubility parameter of dimethylacetamide is 1.0 or less.
3 more elements
Dependencies are inferred from the claim text.