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US 12,525,445 B2Granted
Process solution for polymer processing
AssigneeDongwoo Fine-Chem Co., Ltd.
InventorsSoon-Hong Pang, Han-Byeol Kang, Sung-Sik Kim, Tae-Hee Kim
Life of this patent
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Abstract
The present disclosure relates to a process solution for polymer processing, containing a polar aprotic solvent, a fluorine-based compound, and a sulfur-containing compound. The process solution for polymer processing may have excellent storage stability and minimize damage to the metal layer while improving an ability to remove the adhesive polymer remaining on a circuit surface of a semiconductor wafer.
Claims8
A process solution for polymer processing, comprising a polar aprotic solvent, a fluorine-based compound, and a sulfur-containing compound, and water,
- wherein the process solution has a water content of less than 4% by weight based on a total weight of the process solution,
- wherein the polar aprotic solvent comprises one or more selected from the group consisting of ketone-based, acetate-based, amide-based, pyridine-based, morpholine-based, pyrrolidone-based, urea-based, phosphate-based, nitrile-based, carbonate-based, oxazolidone-based, piperazine-based, and furan-based solvents,
- wherein the fluorine-based compound comprises one or more compounds selected from the group consisting of alkylammonium fluoride, alkylphosphonium fluoride, and alkylsulfonium fluoride,
- wherein the sulfur-containing compound comprises one or more compounds represented by any one of the following Formulas 1-1 to 3:
- R1—SH [Formula 1-1]
- R1—S—S—R1 [Formula 1-2]
- wherein R1 is a linear or branched alkyl group having 3 to 12 carbon atoms unsubstituted or substituted with a thiol group, a cyclic hydrocarbon group having 3 to 12 carbon atoms unsubstituted or substituted with a thiol group or halogen, and the halogen is fluorine, chlorine, bromine, or iodine,
- wherein R2 to R4 and R6 are each independently a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, or an unsaturated hydrocarbon group having 2 to 5 carbon atoms including a double bond, and R5 is a direct linkage or an alkylene group having 1 to 5 carbon atoms,
- wherein the compound represented by Formula 2 is one or more selected from the group consisting of 2-(trimethylsilyl)ethanethiol, trimethyl(2-methylsulfanylethyl)silane, (3-mercaptopropyl)methyldimethoxysilane, and (ethylthio)trimethylsilane, and
- where R7 and R8 are connected to each other to form an unsubstituted or substituted alicyclic or aromatic monocyclic or polycyclic ring, wherein the monocyclic or polycyclic ring comprises one or more hetero atoms selected from nitrogen (N), oxygen (O), or sulfur (S), and
- wherein the compound represented by Formula 3 is one or more selected from the group consisting of 2-amino-5-mercapto-1,3,4-thiadiazole and 2-mercaptobenzoxazole.
8 more elements
Dependencies are inferred from the claim text.