C09K 3/1454
Abrasive powders, suspensions and pastes for polishing
Official title: {Abrasive powders, suspensions and pastes for polishing}
C09K3/1454 (Abrasive powders, suspensions and pastes for polishing) appears on 1,480 US grants and 1,946 published applications in this corpus.
Search patents in C09K- Granted patents
- 1,480
- Published applications
- 1,946
- Assignees
- 477
- Inventors
- 2,856
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 4 | 0 |
| 1978 | 2 | 0 |
| 1979 | 1 | 0 |
| 1980 | 3 | 0 |
| 1981 | 5 | 0 |
| 1982 | 1 | 0 |
| 1983 | 1 | 0 |
| 1984 | 4 | 0 |
| 1985 | 5 | 0 |
| 1986 | 3 | 0 |
| 1987 | 2 | 0 |
| 1988 | 6 | 0 |
| 1989 | 2 | 0 |
| 1990 | 7 | 0 |
| 1991 | 2 | 0 |
| 1992 | 8 | 0 |
| 1993 | 4 | 0 |
| 1994 | 5 | 0 |
| 1995 | 8 | 0 |
| 1996 | 5 | 0 |
| 1997 | 16 | 0 |
| 1998 | 20 | 0 |
| 1999 | 32 | 0 |
| 2000 | 33 | 0 |
| 2001 | 57 | 24 |
| 2002 | 70 | 63 |
| 2003 | 67 | 79 |
| 2004 | 52 | 103 |
| 2005 | 39 | 111 |
| 2006 | 62 | 102 |
| 2007 | 51 | 111 |
| 2008 | 46 | 108 |
| 2009 | 40 | 98 |
| 2010 | 39 | 90 |
| 2011 | 58 | 70 |
| 2012 | 59 | 69 |
| 2013 | 62 | 73 |
| 2014 | 70 | 54 |
| 2015 | 49 | 95 |
| 2016 | 59 | 71 |
| 2017 | 53 | 71 |
| 2018 | 54 | 49 |
| 2019 | 51 | 56 |
| 2020 | 45 | 63 |
| 2021 | 42 | 63 |
| 2022 | 45 | 58 |
| 2023 | 35 | 62 |
| 2024 | 28 | 60 |
| 2025 | 40 | 79 |
| 2026 | 27 | 64 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Methods of forming an abrasive slurry and methods for chemical-mechanical polishing29 Sep 2026US 12,746,637 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Polishing composition for semiconductor process and method for polishing a substrate using the same22 Sep 2026US 12,742,096 B2Ycchem Co., Ltd.
- Compositions for polishing hardmasks and related systems and methods22 Sep 2026US 12,742,097 B2Entegris, Inc.
- Chemical mechanical polishing composition and polishing method22 Sep 2026US 12,742,098 B2Jsr Corporation
- Method for polishing a dental ceramic with nanoparticle composition1 Sep 2026US 12,721,791 B2Imam Abdulrahman Bin Faisal University
- Polishing composition1 Oct 2026US 2026/0297404 A1
- Polishing composition1 Oct 2026US 2026/0297405 A1
- Chemical-mechanical polishing composition containing silica and ceria abrasives1 Oct 2026US 2026/0297406 A1Entegris, Inc.
- Polishing method, abrasive, and semiconductor device24 Sep 2026US 2026/0286181 A1Kioxia Corporation
- Polishing compositions and methods of use thereof24 Sep 2026US 2026/0286184 A1Fujifilm Electronic Materials U.S.A., Inc.
Most cited
By later US patents
- Chemical mechanical polishing slurry for metal layers541US 5,527,423 ACabot Corporation · 1996
- Slurries for chemical mechanical polishing268US 5,340,370 AIntel Corporation · 1994
- Chemical mechanical polishing slurry useful for copper/tantalum substrate192US 6,063,306 ACabot Corporation · 2000
- Chemical mechanical polishing (CMP) slurry for copper and method of use in integrated circuit manufacture190US 5,897,375 AMotorola, Inc. · 1999
- Compositions and structures for chemical mechanical polishing of FeRAM capacitors and method of fabricating FeRAM capacitors using same175US 6,346,741 B1Advanced Technology Materials, Inc. · 2002