C09K 3/1472
Non-aqueous liquid suspensions
Official title: {Non-aqueous liquid suspensions}
C09K3/1472 (Non-aqueous liquid suspensions) appears on 78 US grants and 92 published applications in this corpus.
Search patents in C09K- Granted patents
- 78
- Published applications
- 92
- Assignees
- 73
- Inventors
- 240
- Latest grant
- 17 Mar 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 2 | 0 |
| 1996 | 0 | 0 |
| 1997 | 3 | 0 |
| 1998 | 2 | 0 |
| 1999 | 3 | 0 |
| 2000 | 1 | 0 |
| 2001 | 1 | 0 |
| 2002 | 4 | 8 |
| 2003 | 5 | 7 |
| 2004 | 3 | 9 |
| 2005 | 1 | 3 |
| 2006 | 2 | 2 |
| 2007 | 1 | 5 |
| 2008 | 0 | 2 |
| 2009 | 0 | 4 |
| 2010 | 2 | 4 |
| 2011 | 2 | 3 |
| 2012 | 4 | 4 |
| 2013 | 0 | 5 |
| 2014 | 5 | 2 |
| 2015 | 1 | 7 |
| 2016 | 5 | 6 |
| 2017 | 2 | 7 |
| 2018 | 6 | 4 |
| 2019 | 6 | 0 |
| 2020 | 4 | 3 |
| 2021 | 2 | 0 |
| 2022 | 1 | 5 |
| 2023 | 1 | 0 |
| 2024 | 0 | 2 |
| 2025 | 3 | 0 |
| 2026 | 1 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Dispersant and polishing agent composition17 Mar 2026US 12,577,431 B2Toagosei Co., Ltd.
- Processing system of suspension abrasive jets11 Nov 2025US 12,466,027 B2Industrial Technology Research Institute
- Nanodiamond dispersion composition8 Jul 2025US 12,351,464 B2Daicel Corporation
- Azeotropic or azeotropic-like composition comprising hydrogen fluoride and 1,1,2-trifluoroethane, 1-chloro-2,2-difluoroethane, or 1,2-dichloro-1-fluoroethane18 Mar 2025US 12,251,590 B2Daikin Industries, Ltd.
- Azeotropic or azeotropic-like composition comprising hydrogen fluoride and 1,1,2-trifluoroethane, 1-chloro-2,2-difluoroethane, or 1,2-dichloro-1-fluoroethane28 Nov 2023US 11,826,596 B2Daikin Industries, Ltd.
- Processing method and system of suspension abrasive jets18 Apr 2024US 2024/0123572 A1Industrial Technology Research Institute
- Azeotropic or azeotropic-like composition comprising hydrogen fluoride and 1,1,2-trifluoroethane, 1-chloro-2,2-difluoroethane, or 1,2-dichloro-1-fluoroethane15 Feb 2024US 2024/0050792 A1Daikin Industries, Ltd.
- Foam Abrasive and Method for Producing Same22 Dec 2022US 2022/0403130 A1Robert Bosch GmbH
- Grinding of hard substrates15 Dec 2022US 2022/0396715 A1Entegris, Inc.
- Dispersant and polishing agent composition15 Sep 2022US 2022/0290008 A1Toagosei Co., Ltd.
Most cited
By later US patents
- Chemical mechanical polishing (CMP) slurry for copper and method of use in integrated circuit manufacture190US 5,897,375 AMotorola, Inc. · 1999
- Method for chemical-mechanical polish (CMP) planarizing of cooper containing conductor layers88US 5,780,358 AChartered Semiconductor Manufacturing Ltd. · 1998
- Method and slurry composition for chemical-mechanical polish (CMP) planarizing of copper containing conductor layers53US 5,863,307 AChartered Semiconductor Manufacturing Ltd. · 1999
- Chemical mechanical planarization of low dielectric constant materials38US 6,416,685 B1Honeywell International Inc. · 2002
- Silane containing polishing composition for CMP28US 6,646,348 B1Cabot Microelectronics Corporation · 2003