H10P 76/2047
X-ray beam lithography processes
Official title: {X-ray beam lithography processes}
H10P76/2047 (X-ray beam lithography processes) appears on 21 US grants and 10 published applications in this corpus.
Search patents in H10P- Granted patents
- 21
- Published applications
- 10
- Assignees
- 18
- Inventors
- 66
- Latest grant
- 20 Jan 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 1 | 0 |
| 1980 | 1 | 0 |
| 1981 | 3 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 2 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 2 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 1 |
| 2004 | 0 | 1 |
| 2005 | 0 | 0 |
| 2006 | 1 | 0 |
| 2007 | 0 | 0 |
| 2008 | 0 | 1 |
| 2009 | 0 | 0 |
| 2010 | 0 | 0 |
| 2011 | 1 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 0 |
| 2014 | 0 | 0 |
| 2015 | 1 | 2 |
| 2016 | 0 | 1 |
| 2017 | 2 | 0 |
| 2018 | 0 | 1 |
| 2019 | 0 | 0 |
| 2020 | 1 | 0 |
| 2021 | 0 | 0 |
| 2022 | 0 | 0 |
| 2023 | 0 | 0 |
| 2024 | 0 | 1 |
| 2025 | 0 | 1 |
| 2026 | 1 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Mask for X-ray lithography and metrology20 Jan 2026US 12,532,712 B2Exaktis Corporation
- Compound semiconductor solar cell and method of manufacturing the same18 Feb 2020US 10,566,473 B2LG Electronics Inc.
- High-sensitivity multilayer resist film and method of increasing photosensitivity of resist film11 Jul 2017US 9,703,197 B2National Institute for Materials Science
- Projection patterning with exposure mask14 Feb 2017US 9,570,301 B2National Taiwan University
- Method for lithography patterning22 Sep 2015US 9,140,987 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Modulation of X-Ray Beam Intensity27 Aug 2026US 2026/0251980 A1LumArray, Inc.
- Composition for forming organic film, method for forming organic film, patterning process, and polymer23 Oct 2025US 2025/0326894 A1Shin-Etsu Chemical Co., Ltd.
- Mask for X-Ray Lithography and Metrology4 Apr 2024US 2024/0112913 A1Exaktis Corporation
- Compound semiconductor solar cell and method of manufacturing the same25 Oct 2018US 2018/0308996 A1LG Electronics Inc.
- High-sensitivity multilayer resist film and method of increasing photosensitivity of resist film18 Aug 2016US 2016/0238937 A1National Institute for Materials Science
Most cited
By later US patents
- Fabrication of integrated circuits utilizing thick high-resolution patterns46US 4,244,799 ABell Telephone Laboratories, Incorporated · 1981
- Method of making a density multiplier for semiconductor device manufacturing46US 6,239,008 B1Advanced Micro Devices, Inc. · 2001
- Method of manufacturing solid-state devices in which planar dimensional distortion is reduced32US 4,256,829 AU. S. Philips Corporation · 1981
- X-ray lithography mask27US 4,035,522 AInternational Business Machines Corporation · 1977
- Method for making low barrier Schottky devices of the electron beam evaporation of reactive metals25US 4,379,832 AInternational Business Machines Corporation · 1983