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US 12,532,712 B2Granted
Mask for X-ray lithography and metrology
AssigneeExaktis Corporation
InventorsAnne Sakdinawat, Yanwei Liu
Life of this patent
Estimating the term…
Abstract
A mask apparatus for x-ray lithography and metrology where the x-ray absorber material is embedded in diamond and then covered with a thermally conductive material to provide requisite thermal conductivity when irradiated with x-rays. The apparatus then includes a hollow holder that is thermally interfaced with the mask and may also include means for external thermal control. The mask apparatus allows for transmission of x-rays from a lithography beam as well as metrology beams of other wavelengths including UV, IR, visible, and others.
Claims13
A mask for X-ray lithography and metrology, comprising:
- a substrate composed of diamond material;
- a patterned membrane composed of diamond material;
- an x-ray absorber layer embedded into the patterned membrane;
- and
- at least one capping layer covering a surface of the x-ray absorber layer and the patterned membrane.
2 more elements
Dependencies are inferred from the claim text.