H10P 14/3818
Using particle beams
Official title: {using particle beams}
H10P14/3818 (Using particle beams) appears on 102 US grants and 66 published applications in this corpus.
Search patents in H10P- Granted patents
- 102
- Published applications
- 66
- Assignees
- 72
- Inventors
- 194
- Latest grant
- 5 Mar 2024
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 2 | 0 |
| 1983 | 3 | 0 |
| 1984 | 0 | 0 |
| 1985 | 4 | 0 |
| 1986 | 4 | 0 |
| 1987 | 7 | 0 |
| 1988 | 1 | 0 |
| 1989 | 3 | 0 |
| 1990 | 0 | 0 |
| 1991 | 5 | 0 |
| 1992 | 1 | 0 |
| 1993 | 2 | 0 |
| 1994 | 5 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 3 | 0 |
| 1999 | 2 | 0 |
| 2000 | 2 | 0 |
| 2001 | 2 | 2 |
| 2002 | 0 | 1 |
| 2003 | 2 | 2 |
| 2004 | 5 | 1 |
| 2005 | 1 | 4 |
| 2006 | 1 | 4 |
| 2007 | 2 | 4 |
| 2008 | 4 | 4 |
| 2009 | 4 | 6 |
| 2010 | 4 | 7 |
| 2011 | 6 | 4 |
| 2012 | 0 | 2 |
| 2013 | 6 | 2 |
| 2014 | 1 | 3 |
| 2015 | 1 | 5 |
| 2016 | 2 | 1 |
| 2017 | 1 | 6 |
| 2018 | 6 | 1 |
| 2019 | 1 | 0 |
| 2020 | 1 | 1 |
| 2021 | 1 | 1 |
| 2022 | 2 | 2 |
| 2023 | 2 | 0 |
| 2024 | 1 | 3 |
By publication year. Applications have been published since 2001.
Recent patents
- Film forming apparatus and method for manufacturing part having film containing silicon5 Mar 2024US 11,919,032 B2Tokyo Electron Limited
- Two dimensional materials for use in ultra high density information storage and sensor devices28 Nov 2023US 11,832,535 B2Northeastern University
- Using absolute Z-height values for synergy between tools7 Mar 2023US 11,600,497 B2KLA Corporation
- Plasma annealing method and device for the same29 Nov 2022US 11,511,316 B2Nissan Chemical Industries, Ltd.
- Method of producing epitaxial silicon wafer, epitaxial silicon wafer, and method of producing solid-state imaging device8 Feb 2022US 11,245,014 B2Sumco Corporation
- Multilayer structure15 Aug 2024US 2024/0271325 A1Universitetet I Oslo
- Film forming apparatus and method for manufacturing part having film containing silicon27 Jun 2024US 2024/0207882 A1Tokyo Electron Limited
- Neutral beam annealing apparatus and method of manufacturing display apparatus using the same25 Jan 2024US 2024/0030043 A1Samsung Display Co., Ltd.
- Two Dimensional Materials for Use in Ultra High Density Information Storage and Sensor Devices17 Mar 2022US 2022/0085287 A1Northeastern University
- Film forming apparatus and method for manufacturing part having film containing silicon3 Mar 2022US 2022/0062943 A1Tokyo Electron Limited
Most cited
By later US patents
- Method of fabricating oxide semiconductor device3,948US 7,468,304 B2Canon Kabushiki Kaisha · 2008
- Thin film semiconductor device and method for manufacture281US 4,400,715 AInternational Business Machines Corporation · 1983
- Semiconductor device273US 4,643,950 AAgency of Industrial Science and Technology · 1987
- Method of crystallizing amorphous material with a moving energy beam218US 4,309,225 AMassachusetts Institute of Technology · 1982
- Method for manufacturing three-dimensional semiconductor device by sequential beam epitaxy110US 4,498,226 ATokyo Shibaura Denki Kabushiki Kaisha · 1985