H10P 14/22
Using physical deposition
Official title: using physical deposition, e.g. vacuum deposition or sputtering
H10P14/22 (Using physical deposition) appears on 2,041 US grants and 2,237 published applications in this corpus.
Search patents in H10P- Granted patents
- 2,041
- Published applications
- 2,237
- Assignees
- 677
- Inventors
- 3,727
- Latest grant
- 1 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 8 | 0 |
| 1977 | 6 | 0 |
| 1978 | 8 | 0 |
| 1979 | 11 | 0 |
| 1980 | 19 | 0 |
| 1981 | 4 | 0 |
| 1982 | 5 | 0 |
| 1983 | 8 | 0 |
| 1984 | 5 | 0 |
| 1985 | 12 | 0 |
| 1986 | 7 | 0 |
| 1987 | 6 | 0 |
| 1988 | 7 | 0 |
| 1989 | 20 | 0 |
| 1990 | 15 | 0 |
| 1991 | 15 | 0 |
| 1992 | 15 | 0 |
| 1993 | 25 | 0 |
| 1994 | 16 | 0 |
| 1995 | 22 | 0 |
| 1996 | 20 | 0 |
| 1997 | 12 | 0 |
| 1998 | 20 | 0 |
| 1999 | 17 | 0 |
| 2000 | 16 | 0 |
| 2001 | 11 | 3 |
| 2002 | 25 | 30 |
| 2003 | 21 | 28 |
| 2004 | 20 | 31 |
| 2005 | 16 | 27 |
| 2006 | 21 | 29 |
| 2007 | 17 | 36 |
| 2008 | 16 | 50 |
| 2009 | 30 | 54 |
| 2010 | 39 | 105 |
| 2011 | 58 | 152 |
| 2012 | 81 | 118 |
| 2013 | 78 | 109 |
| 2014 | 124 | 174 |
| 2015 | 135 | 152 |
| 2016 | 148 | 171 |
| 2017 | 140 | 156 |
| 2018 | 123 | 140 |
| 2019 | 114 | 101 |
| 2020 | 104 | 120 |
| 2021 | 78 | 94 |
| 2022 | 78 | 93 |
| 2023 | 58 | 88 |
| 2024 | 72 | 80 |
| 2025 | 67 | 72 |
| 2026 | 48 | 24 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Particle reduction in physical vapor deposition of amorphous silicon1 Sep 2026US 12,723,304 B2APPLIED Materials.Inc.
- Semiconductor film25 Aug 2026US 12,720,828 B2NGK Insulators, Ltd.
- Furnace apparatus for crystal production18 Aug 2026US 12,709,819 B2Zadient Technologies SAS
- Display device18 Aug 2026US 12,711,927 B2Semiconductor Energy Laboratory Co.Ltd.
- Nitride laminate and manufacturing method of the same18 Aug 2026US 12,713,843 B2Nitto Denko Corporation
- Semiconductor device structure and manufacturing method thereof8 Oct 2026US 2026/0314277 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Heteroepitaxial growth method of compound semiconductor materials on multi-oriented semiconductor substrates and devices17 Sep 2026US 2026/0282771 A1King Abdullah University of Science and Technology
- Method for manufacturing thin film transistor, sputtering target, and sintered body3 Sep 2026US 2026/0262239 A1Kobelco Research Institute, Inc.
- Method for modifying insulating film and method for manufacturing semiconductor device20 Aug 2026US 2026/0247722 A1Semiconductor Energy Laboratory Co.Ltd.
- Manufacturing Method Of Semiconductor Device13 Aug 2026US 2026/0239937 A1Semiconductor Energy Laboratory Co.Ltd.
Most cited
By later US patents
- Semiconductor device and manufacturing method thereof4,349US 7,674,650 B2Semiconductor Energy Laboratory Co.Ltd. · 2010
- Semiconductor device and manufacturing method thereof4,064US 7,732,819 B2Semiconductor Energy Laboratory Co.Ltd. · 2010
- LnCuO(S,Se,Te)monocrystalline thin film, its manufacturing method, and optical device or electronic device using the monocrystalline thin film3,969US 7,323,356 B2Japan Science and Technology Agency · 2008
- Field-effect transistor and method for manufacturing the same3,966US 7,411,209 B2Canon Kabushiki Kaisha · 2008
- Method for forming ZnO film, method for forming ZnO semiconductor layer, method for fabricating semiconductor device, and semiconductor device3,939US 7,049,190 B2Sanyo Electric Co., Ltd. · 2006