Nitride laminate and manufacturing method of the same
AssigneeNitto Denko Corporation
InventorsMasahiko Watanabe, Toshitaka Nakamura, Hironobu Machinaga
Life of this patent
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Abstract
A nitride laminate, in which contamination in the nitride layer is suppressed and crystallinity is improved, is provided. A nitride laminate includes a polymer substrate, and a nitride layer provided on at least one of the surfaces of the polymer substrate. The nitride layer has a wurtzite crystal structure. The atomic proportion of oxygen in the nitride layer is 2.5 atm. % or less, and the atomic proportion of hydrogen in the nitride layer is 2.0 atm. % or less. The FWHM of the X-ray rocking curve of the nitride layer is 8 degree or less.
Claims8
A nitride laminate comprising:
- a polymer substrate;
- a nitride layer provided on at least one of surfaces of the polymer substrate;
- and
- a metal layer between the polymer substrate and the nitride layer,
- wherein the nitride layer is in direct contact with the metal layer,
- wherein the nitride layer has a wurtzite crystal structure,
- wherein an atomic proportion of oxygen in the nitride layer is 2.5 atm. % or less, and an atomic proportion of hydrogen in the nitride layer is 2.0 atm. % or less, and
- wherein a full width at half maximum of an X-ray rocking curve of the nitride layer is 8 degrees or less.
A manufacturing method of a nitride laminate, comprising:
- forming a metal layer over a polymer substrate;
- forming a nitride layer over the metal layer and in direct contact with the metal layer by a high power impulse magnetron sputtering at a substrate temperature of 150° C. or lower,
- wherein the nitride layer has a wurtzite crystal structure,
- wherein an atomic proportion of oxygen in the nitride layer is 2.5 atm. % or less, and an atomic proportion of hydrogen in the nitride layer is 2.0 atm. % or less, and
- wherein a full width at half maximum of an X-ray rocking curve of the nitride layer is 8 degrees or less.
Dependencies are inferred from the claim text.