H10D 64/015
Removing at least parts of gate spacers
Official title: {removing at least parts of gate spacers, e.g. disposable spacers}
H10D64/015 (Removing at least parts of gate spacers) appears on 3,383 US grants and 3,830 published applications in this corpus.
Search patents in H10D- Granted patents
- 3,383
- Published applications
- 3,830
- Assignees
- 286
- Inventors
- 4,021
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1984 | 1 | 0 |
| 1985 | 1 | 0 |
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 2 | 0 |
| 1989 | 2 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 2 | 0 |
| 1996 | 0 | 0 |
| 1997 | 2 | 0 |
| 1998 | 8 | 0 |
| 1999 | 11 | 0 |
| 2000 | 20 | 0 |
| 2001 | 36 | 5 |
| 2002 | 49 | 44 |
| 2003 | 49 | 41 |
| 2004 | 55 | 56 |
| 2005 | 38 | 89 |
| 2006 | 57 | 92 |
| 2007 | 53 | 123 |
| 2008 | 51 | 142 |
| 2009 | 80 | 115 |
| 2010 | 100 | 80 |
| 2011 | 96 | 93 |
| 2012 | 73 | 105 |
| 2013 | 114 | 109 |
| 2014 | 115 | 110 |
| 2015 | 136 | 157 |
| 2016 | 174 | 198 |
| 2017 | 229 | 222 |
| 2018 | 228 | 237 |
| 2019 | 254 | 239 |
| 2020 | 279 | 306 |
| 2021 | 229 | 255 |
| 2022 | 176 | 241 |
| 2023 | 183 | 253 |
| 2024 | 203 | 206 |
| 2025 | 192 | 237 |
| 2026 | 82 | 75 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
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- Replacement sidewall spacers8 Oct 2026US 2026/0314013 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Methods of forming gate-all-around (gaa) devices1 Oct 2026US 2026/0304842 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Backside contact with bottom inner spacer24 Sep 2026US 2026/0293187 A1International Business Machines Corporation
- Integrated circuit structure and method for fabricating the same10 Sep 2026US 2026/0271387 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Semiconductor structure and method of manufacturing the same20 Aug 2026US 2026/0247676 A1Taiwan Semiconductor Manufacturing Company.Ltd
Most cited
By later US patents
- Wrap-around contact550US 9,443,769 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2016
- Uniformity tuning of variable-height features formed in trenches349US 10,332,963 B1Globalfoundries Inc. · 2019
- Vertical field-effect transistor with uniform bottom spacer288US 10,229,985 B1International Business Machines Corporation · 2019
- MOS transistor with assisted-gates and ultra-shallow “Psuedo” source and drain extensions for ultra-large-scale integration245US 6,312,995 B1Advanced Micro Devices, Inc. · 2001
- Method for fabricating a strained structure243US 8,497,528 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2013