H01J 37/32954
Electron temperature measurement
Official title: {Electron temperature measurement}
H01J37/32954 (Electron temperature measurement) appears on 34 US grants and 49 published applications in this corpus.
Search patents in H01J- Granted patents
- 34
- Published applications
- 49
- Assignees
- 28
- Inventors
- 121
- Latest grant
- 8 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1991 | 2 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 1 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 1 |
| 2004 | 0 | 2 |
| 2005 | 1 | 2 |
| 2006 | 0 | 1 |
| 2007 | 0 | 1 |
| 2008 | 3 | 1 |
| 2009 | 0 | 1 |
| 2010 | 0 | 2 |
| 2011 | 1 | 2 |
| 2012 | 1 | 1 |
| 2013 | 2 | 3 |
| 2014 | 3 | 2 |
| 2015 | 0 | 1 |
| 2016 | 2 | 4 |
| 2017 | 2 | 0 |
| 2018 | 2 | 3 |
| 2019 | 1 | 1 |
| 2020 | 2 | 2 |
| 2021 | 3 | 3 |
| 2022 | 1 | 2 |
| 2023 | 0 | 0 |
| 2024 | 2 | 6 |
| 2025 | 3 | 4 |
| 2026 | 1 | 4 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Plasma measuring method and plasma processing apparatus8 Sep 2026US 12,731,772 B2Tokyo Electron Limited
- Non-intrusive method for 2D/3D mapping plasma parameters2 Dec 2025US 12,487,182 B2Tokyo Electron Limited
- Langmuir probe operating at fixed voltages4 Feb 2025US 12,219,685 B2Lockheed Martin Corporation
- HTCC antenna for generation of microplasma14 Jan 2025US 12,198,897 B2Inficon GmbH
- Plasma processing apparatus and control method20 Aug 2024US 12,068,208 B2Tokyo Electron Limited
- Systems and methods for achieving uniformity with multiple coils24 Sep 2026US 2026/0290770 A1Lam Research Corporation
- Plasma measurement method and plasma measurement system17 Sep 2026US 2026/0279747 A1Tokyo Electron Limited
- Plasma Processing Device and Plasma Measuring Method2 Jul 2026US 2026/0188631 A1Tokyo Electron Limited
- Vertical plasma source12 Mar 2026US 2026/0074158 A1APPLIED Materials.Inc.
- Apparatus for fabricating display panel21 Aug 2025US 2025/0266251 A1Samsung Display Co., Ltd.
Most cited
By later US patents
- Vertical gate separation133US 9,449,846 B2APPLIED Materials.Inc. · 2016
- Anisotropic gap etch129US 9,502,258 B2APPLIED Materials.Inc. · 2016
- Silicon selective removal110US 9,881,805 B2APPLIED Materials.Inc. · 2018
- Sensor array for measuring plasma characteristics in plasma processing environments106US 6,902,646 B2Advanced Energy Industries, Inc. · 2005
- Method of detecting end point of plasma processing and apparatus for the same44US 5,928,532 ATokyo Electron Limited · 1999