HTCC antenna for generation of microplasma

A gas sensor comprising:

• a plasma generating device having a first side and an opposing second side, the plasma generating device comprising,
• a split-ring conductor surrounded by a ceramic matrix and configured to generate a plasma proximate to the first side,
• an optical element extending through the ceramic matrix between the first side and the second side, wherein the optical element is configured to collect light emitted by the plasma;
• and
• a connector electrically connected to the split-ring conductor,
• wherein the optical element is hermetically sealed to the ceramic matrix using one of:
• (1) a braze seal;
• and (2) a compression seal.

A method of manufacturing a plasma generating device, the method comprising:

• forming a support from a ceramic matrix in a green state, wherein the support comprises a first side and an opposing second side;
• embedding a split-ring conductor and hermetically sealed via in the ceramic matrix as part of the forming of the support, wherein the hermetically sealed via extends from the split-ring conductor to the second side of the support;
• firing said ceramic matrix with the embedded split-ring conductor;
• positioning a ground plane proximate to the second side of the support before or after the firing;
• and
• polishing the first side of the support to achieve a desired thickness of ceramic matrix between the first side and the split-ring conductor, wherein the desired thickness of the ceramic matrix corresponds to a desired resonance frequency.

A method of manufacturing a split-ring resonator plasma generation device, the method comprising:

• providing a plurality of ceramic tapes;
• creating at least one pattern of metallization on at least one of the plurality of ceramic tapes, wherein the at least one pattern of metallization comprises a split-ring resonator;
• stacking the plurality of ceramic tapes;
• firing the stack to produce a hermetically sealed antenna structure comprising a split-ring conductor in s ceramic matrix;
• and
• polishing the hermetically sealed antenna structure in an area over the split-ring conductor.

A gas sensing system comprising:

• a plasma generation device comprising,
• a split-ring resonator microstrip comprising,
• a split-ring conductor, and
• a ceramic matrix configured to surround and support the split-ring conductor;
• and
• a temperature sensor in thermal communication with the plasma generation device to determine the temperature of the plasma generation device, wherein the temperature of the plasma generation device is taken into account during operation of the gas sensing system.

A gas sensing system comprising:

• a plasma generation device comprising,
• a split-ring resonator microstrip comprising,
• a split-ring conductor, and
• a ceramic matrix configured to support the split-ring resonator microstrip, wherein the split-ring conductor is embedded within the ceramic matrix;
• and
• a two-connection flow through gas cell defining a gas passage through a plasma chamber, wherein the gas cell comprises an optical window positioned substantially across the plasma chamber from and parallel to the ceramic matrix of the plasma generation device,
• wherein the gas cell is configured to provide a gas flow in a direction that is substantially parallel to a plane of the plasma generation device and a plane of the optical window, wherein the gas passage and the plasma chamber comprise features of a size smaller than about 10 mm along a direction that is substantially normal to the direction of gas flow.