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US 2026/0074158 A1Published application
Vertical plasma source
AssigneeApplied Materials, Inc.
InventorsANANTHA SUBRAMANI, KALLOL BERA, SEYYED FAZELI, RUPALI SAHU
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Abstract
Embodiments disclosed herein include a plasma source including a ground electrode including a plurality of ground electrode portions. The plasma source also includes a power electrode including a plurality of power electrode portions. Ones of the power electrode portions are interleaved with ones of the ground electrode portions.
Claims20
A plasma source, comprising:
- a ground electrode comprising a plurality of ground electrode portions;
- and
- a power electrode comprising a plurality of power electrode portions, wherein ones of the power electrode portions are interleaved with ones of the ground electrode portions.
A plasma process chamber, comprising:
- a pedestal for supporting a workpiece in a processing volume;
- a plasma source in a portion of the processing volume above the pedestal, the plasma source comprising a ground electrode comprising a plurality of ground electrode portions, and a power electrode comprising a plurality of power electrode portions, wherein ones of the power electrode portions are interleaved with ones of the ground electrode portions;
- and
- a chamber top or lid over the plasma source.
1 more element
A method of generating a plasma, comprising:
- powering a plasma source, the plasma source comprising a ground electrode comprising a plurality of ground electrode portions, and a power electrode comprising a plurality of power electrode portions, wherein ones of the power electrode portions are interleaved with ones of the ground electrode portions.
Dependencies are inferred from the claim text.