H01J 37/261
Details
Official title: {Details}
H01J37/261 (Details) appears on 1,252 US grants and 1,409 published applications in this corpus.
Search patents in H01J- Granted patents
- 1,252
- Published applications
- 1,409
- Assignees
- 271
- Inventors
- 2,329
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 2 | 0 |
| 1978 | 3 | 0 |
| 1979 | 1 | 0 |
| 1980 | 1 | 0 |
| 1981 | 2 | 0 |
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 5 | 0 |
| 1985 | 3 | 0 |
| 1986 | 1 | 0 |
| 1987 | 3 | 0 |
| 1988 | 2 | 0 |
| 1989 | 5 | 0 |
| 1990 | 3 | 0 |
| 1991 | 4 | 0 |
| 1992 | 3 | 0 |
| 1993 | 3 | 0 |
| 1994 | 7 | 0 |
| 1995 | 3 | 0 |
| 1996 | 3 | 0 |
| 1997 | 2 | 0 |
| 1998 | 4 | 0 |
| 1999 | 1 | 0 |
| 2000 | 3 | 0 |
| 2001 | 3 | 4 |
| 2002 | 6 | 12 |
| 2003 | 9 | 15 |
| 2004 | 19 | 29 |
| 2005 | 20 | 28 |
| 2006 | 25 | 41 |
| 2007 | 25 | 35 |
| 2008 | 37 | 54 |
| 2009 | 25 | 42 |
| 2010 | 45 | 42 |
| 2011 | 36 | 46 |
| 2012 | 43 | 31 |
| 2013 | 48 | 67 |
| 2014 | 72 | 72 |
| 2015 | 71 | 96 |
| 2016 | 78 | 61 |
| 2017 | 56 | 42 |
| 2018 | 57 | 44 |
| 2019 | 52 | 74 |
| 2020 | 84 | 74 |
| 2021 | 60 | 72 |
| 2022 | 62 | 102 |
| 2023 | 69 | 90 |
| 2024 | 60 | 78 |
| 2025 | 65 | 95 |
| 2026 | 58 | 63 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Assessment system, method of assessing6 Oct 2026US 12,755,929 B2ASML Netherlands B. V.
- Discharging a region of a sample29 Sep 2026US 12,749,648 B2Applied Materials Israel Ltd.
- System and method for inspection by deflector control in a charged particle system22 Sep 2026US 12,744,178 B2ASML Netherlands B. V.
- Method and system for analyzing three-dimensional features22 Sep 2026US 12,744,180 B2FEI Company
- Inspection system15 Sep 2026US 12,736,487 B2Hitachi High-Tech Corporation
- Sample preparation system for electron microscopy8 Oct 2026US 2026/0309653 A1The Regents of the University of California
- Systems and methods for optimizing scanning of samples in inspection systems8 Oct 2026US 2026/0311960 A1ASML Netherlands B. V.
- Compensating for collection variation of scanning charged particle-optical apparatus8 Oct 2026US 2026/0311961 A1ASML Netherlands B. V.
- Multi-Mode Radio Frequency Cavity1 Oct 2026US 2026/0302123 A1Board of Trustees of Michigan State University
- Scanning electron microscopy-based sample analysis1 Oct 2026US 2026/0302129 A1Infineon Technologies AG
Most cited
By later US patents
- Method of detecting defects in patterned substrates227US 6,252,412 B1Schlumberger Technologies, Inc. · 2001
- Charged particle beam apparatus and method for operating the same178US 7,045,781 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH · 2006
- Charged particle beam apparatus and method for operating the same159US 7,274,018 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH · 2007
- Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus74US 6,107,637 AHitachi, Ltd. · 2000
- Detection of defects in patterned substrates71US 7,253,645 B2APPLIED Materials.Inc. · 2007