H01J 37/265
Controlling the tube
Official title: {Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination}
H01J37/265 (Controlling the tube) appears on 843 US grants and 977 published applications in this corpus.
Search patents in H01J- Granted patents
- 843
- Published applications
- 977
- Assignees
- 166
- Inventors
- 1,656
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 2 | 0 |
| 1978 | 2 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 2 | 0 |
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 3 | 0 |
| 1985 | 2 | 0 |
| 1986 | 1 | 0 |
| 1987 | 2 | 0 |
| 1988 | 2 | 0 |
| 1989 | 4 | 0 |
| 1990 | 3 | 0 |
| 1991 | 3 | 0 |
| 1992 | 2 | 0 |
| 1993 | 3 | 0 |
| 1994 | 6 | 0 |
| 1995 | 3 | 0 |
| 1996 | 3 | 0 |
| 1997 | 2 | 0 |
| 1998 | 3 | 0 |
| 1999 | 1 | 0 |
| 2000 | 3 | 0 |
| 2001 | 3 | 4 |
| 2002 | 5 | 11 |
| 2003 | 8 | 11 |
| 2004 | 18 | 25 |
| 2005 | 16 | 22 |
| 2006 | 23 | 39 |
| 2007 | 21 | 33 |
| 2008 | 31 | 45 |
| 2009 | 21 | 37 |
| 2010 | 39 | 22 |
| 2011 | 28 | 37 |
| 2012 | 33 | 26 |
| 2013 | 36 | 32 |
| 2014 | 38 | 31 |
| 2015 | 34 | 38 |
| 2016 | 33 | 32 |
| 2017 | 24 | 23 |
| 2018 | 30 | 23 |
| 2019 | 28 | 44 |
| 2020 | 49 | 52 |
| 2021 | 36 | 53 |
| 2022 | 47 | 78 |
| 2023 | 53 | 66 |
| 2024 | 41 | 61 |
| 2025 | 50 | 81 |
| 2026 | 43 | 51 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Assessment system, method of assessing6 Oct 2026US 12,755,929 B2ASML Netherlands B. V.
- Discharging a region of a sample29 Sep 2026US 12,749,648 B2Applied Materials Israel Ltd.
- System and method for inspection by deflector control in a charged particle system22 Sep 2026US 12,744,178 B2ASML Netherlands B. V.
- Method and system for analyzing three-dimensional features22 Sep 2026US 12,744,180 B2FEI Company
- Inspection system15 Sep 2026US 12,736,487 B2Hitachi High-Tech Corporation
- Systems and methods for optimizing scanning of samples in inspection systems8 Oct 2026US 2026/0311960 A1ASML Netherlands B. V.
- Compensating for collection variation of scanning charged particle-optical apparatus8 Oct 2026US 2026/0311961 A1ASML Netherlands B. V.
- Multi-Mode Radio Frequency Cavity1 Oct 2026US 2026/0302123 A1Board of Trustees of Michigan State University
- Scanning electron microscopy-based sample analysis1 Oct 2026US 2026/0302129 A1Infineon Technologies AG
- Particle beam microscope24 Sep 2026US 2026/0290747 A1
Most cited
By later US patents
- Method of detecting defects in patterned substrates227US 6,252,412 B1Schlumberger Technologies, Inc. · 2001
- Charged particle beam apparatus and method for operating the same178US 7,045,781 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH · 2006
- Charged particle beam apparatus and method for operating the same159US 7,274,018 B2ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH · 2007
- Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus74US 6,107,637 AHitachi, Ltd. · 2000
- Detection of defects in patterned substrates71US 7,253,645 B2APPLIED Materials.Inc. · 2007