H01J 37/15
External mechanical adjustment of electron or ion optical components
Official title: External mechanical adjustment of electron or ion optical components (H01J37/067, H01J37/20 take precedence)
H01J37/15 (External mechanical adjustment of electron or ion optical components) appears on 66 US grants and 65 published applications in this corpus.
Search patents in H01J- Granted patents
- 66
- Published applications
- 65
- Assignees
- 37
- Inventors
- 164
- Latest grant
- 21 Apr 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 1 | 0 |
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 2 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 2 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 1 | 0 |
| 2003 | 1 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 1 |
| 2006 | 1 | 4 |
| 2007 | 1 | 3 |
| 2008 | 3 | 2 |
| 2009 | 2 | 3 |
| 2010 | 3 | 1 |
| 2011 | 1 | 4 |
| 2012 | 2 | 3 |
| 2013 | 4 | 3 |
| 2014 | 2 | 1 |
| 2015 | 4 | 2 |
| 2016 | 2 | 2 |
| 2017 | 2 | 1 |
| 2018 | 0 | 3 |
| 2019 | 2 | 2 |
| 2020 | 1 | 5 |
| 2021 | 4 | 6 |
| 2022 | 6 | 2 |
| 2023 | 3 | 5 |
| 2024 | 6 | 5 |
| 2025 | 2 | 5 |
| 2026 | 3 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Actuator arrangement and electron-optical column21 Apr 2026US 12,609,265 B2ASML Netherlands B. V.
- FIB and SEM resolution enhancement using asymmetric probe deconvolution7 Apr 2026US 12,597,583 B2FEI Company
- Charged particle optics components and their fabrication13 Jan 2026US 12,525,422 B2FEI Company
- Method and apparatus for inspection16 Dec 2025US 12,500,063 B2ASML Netherlands B. V.
- Adjustable support for arc chamber of ion source9 Sep 2025US 12,412,725 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Ion Beam Adjustment Method and Ion Beam Device23 Jul 2026US 2026/0213116 A1Hitachi High-Tech Corporation
- Ion implanter28 May 2026US 2026/0148925 A1Advanced Ion Beam Technology, Inc.
- Split-column acceleration tube for scanning electron microscope13 Nov 2025US 2025/0349498 A1FEI Company
- Modular assembly23 Oct 2025US 2025/0329509 A1ASML Netherlands B. V.
- Adjustable support for arc chamber of ion source16 Oct 2025US 2025/0323004 A1Taiwan Semiconductor Manufacturing Company.Ltd
Most cited
By later US patents
- Pattern-definition device for maskless particle-beam exposure apparatus76US 7,084,411 B2IMS Nanofabrication GmbH · 2006
- Ion beam apparatus51US 5,920,076 AAPPLIED Materials.Inc. · 1999
- Ion beam machining techniques and apparatus41US 4,128,765 A1978
- Structure for alignment of an ion source aperture with a predetermined ion beam path31US 5,420,415 AEaton Corporation · 1995
- High-voltage insulation device for charged-particle optical apparatus23US 9,093,201 B2IMS Nanofabrication GmbH · 2015