H01J 2237/3345
Anisotropy
Official title: anisotropy
H01J2237/3345 (Anisotropy) appears on 78 US grants and 66 published applications in this corpus.
Search patents in H01J- Granted patents
- 78
- Published applications
- 66
- Assignees
- 44
- Inventors
- 209
- Latest grant
- 4 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 2 | 0 |
| 1990 | 2 | 0 |
| 1991 | 0 | 0 |
| 1992 | 1 | 0 |
| 1993 | 2 | 0 |
| 1994 | 2 | 0 |
| 1995 | 4 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 2 | 0 |
| 1999 | 4 | 0 |
| 2000 | 10 | 0 |
| 2001 | 6 | 4 |
| 2002 | 6 | 6 |
| 2003 | 4 | 1 |
| 2004 | 5 | 4 |
| 2005 | 1 | 0 |
| 2006 | 1 | 0 |
| 2007 | 0 | 1 |
| 2008 | 1 | 0 |
| 2009 | 0 | 0 |
| 2010 | 0 | 1 |
| 2011 | 0 | 0 |
| 2012 | 0 | 0 |
| 2013 | 1 | 0 |
| 2014 | 1 | 2 |
| 2015 | 0 | 2 |
| 2016 | 0 | 3 |
| 2017 | 1 | 2 |
| 2018 | 4 | 3 |
| 2019 | 1 | 3 |
| 2020 | 1 | 2 |
| 2021 | 2 | 4 |
| 2022 | 1 | 1 |
| 2023 | 0 | 3 |
| 2024 | 3 | 11 |
| 2025 | 3 | 7 |
| 2026 | 5 | 6 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Multi-state RF pulsing in cycling recipes to reduce charging induced defects4 Aug 2026US 12,700,567 B2Lam Research Corporation
- Methods and systems for dry etching4 Aug 2026US 12,701,964 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Plasma processing device and plasma processing method19 May 2026US 12,633,499 B2Tokyo Electron Limited
- Systems and methods for radiofrequency signal generator-based control of impedance matching system12 May 2026US 12,626,887 B2Lam Research Corporation
- Substrate processing method, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium17 Mar 2026US 12,581,882 B2Kokusai Electric Corporation
- Methods and systems for dry etching8 Oct 2026US 2026/0314324 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Systems and Methods for Radiofrequency Signal Generator-Based Control of Impedance Matching System20 Aug 2026US 2026/0245834 A1Lam Research Corporation
- Apparatus for producing functional film and method for producing functional film6 Aug 2026US 2026/0229465 A1Konica Minolta, Inc.
- Anisotropic aluminium etching6 Aug 2026US 2026/0231705 A1Nederlandse Organisatie voor toegepast-natuurwetenschappelijk onderzoek TNO
- Plasma processing apparatus and plasma processing method4 Jun 2026US 2026/0155340 A1Hitachi High-Tech Corporation
Most cited
By later US patents
- Vacuum processing chamber having multi-mode access485US 6,095,083 AApplied Materiels, Inc. · 2000
- Inductively coupled RF plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners190US 6,074,512 AAPPLIED Materials.Inc. · 2000
- Processes depending on plasma generation using a helical resonator178US 4,918,031 AAmerican Telephone and Telegraph Company, AT&T Bell Laboratories · 1990
- Plasma reactor having an inductive antenna coupling power through a parallel plate electrode176US 6,077,384 AAPPLIED Materials.Inc. · 2000
- Apparatus and method for pulsed plasma processing of a semiconductor substrate106US 6,253,704 B1Mattson Technology, Inc. · 2001