Systems and methods for radiofrequency signal generator-based control of impedance matching system

A radiofrequency signal supply system for plasma generation, comprising:

• a radiofrequency signal generator configured to generate radiofrequency signals and transmit the radiofrequency signals through an output of the radiofrequency signal generator, the radiofrequency signal generator including a control system configured to determine a real-time value of an indicator parameter indicative of an efficacy of transmission of radiofrequency power to a plasma processing system, wherein the indicator parameter is one or more of a radiofrequency signal reflection coefficient, a negative-to-positive reflected power ratio, and a negative-to-positive delivered power ratio;
• an impedance matching system having an input connected to the output of the radiofrequency signal generator, an output connected to a radiofrequency feed structure of a plasma processing system, a first control capacitor connected between the input of the impedance matching system and a reference potential, and a second control capacitor connected between a first terminal of a first inductor and the reference potential, the first inductor having a second terminal connected to the output of the impedance matching system;
• and
• a control module connected in data communication with each of the radiofrequency signal generator and the impedance matching system, the control module configured to generate control signals for the impedance matching system based on the real-time value of the indicator parameter determined by the control system of the radiofrequency signal generator, the control signals directing control of the first control capacitor and the second control capacitor to cause movement of the real-time value of the indicator parameter toward a corresponding target value, the control module programmed to transmit the control signals to the control system of the radiofrequency signal generator.