H01J 2237/30483
Scanning
H01J2237/30483 (Scanning) appears on 218 US grants and 230 published applications in this corpus.
Search patents in H01J- Granted patents
- 218
- Published applications
- 230
- Assignees
- 98
- Inventors
- 464
- Latest grant
- 7 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 1 | 0 |
| 1984 | 2 | 0 |
| 1985 | 3 | 0 |
| 1986 | 0 | 0 |
| 1987 | 2 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 2 | 0 |
| 1995 | 3 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 3 | 0 |
| 1999 | 1 | 0 |
| 2000 | 0 | 0 |
| 2001 | 4 | 1 |
| 2002 | 3 | 2 |
| 2003 | 2 | 2 |
| 2004 | 1 | 3 |
| 2005 | 4 | 9 |
| 2006 | 5 | 10 |
| 2007 | 9 | 12 |
| 2008 | 8 | 23 |
| 2009 | 18 | 15 |
| 2010 | 16 | 9 |
| 2011 | 6 | 6 |
| 2012 | 10 | 10 |
| 2013 | 4 | 8 |
| 2014 | 14 | 8 |
| 2015 | 12 | 22 |
| 2016 | 13 | 10 |
| 2017 | 12 | 7 |
| 2018 | 7 | 6 |
| 2019 | 8 | 10 |
| 2020 | 6 | 6 |
| 2021 | 10 | 3 |
| 2022 | 7 | 7 |
| 2023 | 5 | 8 |
| 2024 | 0 | 11 |
| 2025 | 10 | 13 |
| 2026 | 3 | 9 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Method for particle beam-induced processing of a defect of a microlithographic photomask7 Jul 2026US 12,676,283 B2Carl Zeiss SMT GmbH
- Substrate analysis system7 Jul 2026US 12,676,288 B2Samsung Electronics Co., Ltd.
- Substrate stress management using variable energy and variable dose implantation21 Apr 2026US 12,609,280 B2APPLIED Materials.Inc.
- Multiple charged particle beam writing method and multiple charged particle beam writing apparatus30 Dec 2025US 12,512,297 B2NuFlare Technology, Inc.
- Ion implantation method, ion implanter, and method for manufacturing semiconductor device11 Nov 2025US 12,469,677 B2Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Charged particle beam device and deposition method17 Sep 2026US 2026/0279725 A1Kioxia Corporation
- Line edge smoothing with jittered twist13 Aug 2026US 2026/0237589 A1Axcelis Technologies, Inc.
- Method for particle beam-induced processing of a defect of a microlithographic photomask16 Jul 2026US 2026/0204510 A1Carl Zeiss SMT GmbH
- Multi-charged-particle-beam writing method and multi-charged-particle-beam writing apparatus11 Jun 2026US 2026/0162933 A1NuFlare Technology, Inc.
- Scanned beam dose rate measurement for ion beam optimization28 May 2026US 2026/0148932 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Multijunction photovoltaic cells and panels using a silicon or silicon-germanium active substrate cell for space and terrestrial applications199US 6,340,788 B12002
- Method for maskless particle-beam exposure90US 7,777,201 B2IMS Nanofabrication GmbH · 2010
- Method for maskless particle-beam exposure73US 8,115,183 B2IMS Nanofabrication GmbH · 2012
- Dose modulation and pixel deflection for raster scan lithography66US 5,393,987 AEtec Systems, Inc. · 1995
- Graphical automated machine control and metrology52US 6,889,113 B2FEI Company · 2005