H01J 2237/30472
Controlling the beam
H01J2237/30472 (Controlling the beam) appears on 530 US grants and 557 published applications in this corpus.
Search patents in H01J- Granted patents
- 530
- Published applications
- 557
- Assignees
- 161
- Inventors
- 943
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 1 | 0 |
| 1984 | 2 | 0 |
| 1985 | 3 | 0 |
| 1986 | 1 | 0 |
| 1987 | 2 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 2 | 0 |
| 1993 | 3 | 0 |
| 1994 | 3 | 0 |
| 1995 | 7 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 4 | 0 |
| 1999 | 2 | 0 |
| 2000 | 0 | 0 |
| 2001 | 5 | 3 |
| 2002 | 5 | 2 |
| 2003 | 4 | 6 |
| 2004 | 4 | 5 |
| 2005 | 7 | 16 |
| 2006 | 12 | 26 |
| 2007 | 12 | 31 |
| 2008 | 26 | 46 |
| 2009 | 33 | 34 |
| 2010 | 36 | 23 |
| 2011 | 19 | 20 |
| 2012 | 19 | 16 |
| 2013 | 15 | 17 |
| 2014 | 27 | 18 |
| 2015 | 34 | 51 |
| 2016 | 37 | 32 |
| 2017 | 34 | 24 |
| 2018 | 17 | 20 |
| 2019 | 30 | 28 |
| 2020 | 27 | 27 |
| 2021 | 21 | 12 |
| 2022 | 19 | 20 |
| 2023 | 17 | 22 |
| 2024 | 10 | 18 |
| 2025 | 17 | 25 |
| 2026 | 8 | 15 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Method for operating a multi-beam particle microscope with fast closed-loop beam current control, computer program product and multi-beam particle microscope25 Aug 2026US 12,719,015 B2Carl Zeiss MultiSEM GmbH
- Method and apparatus for continuous chained energy ion implantation4 Aug 2026US 12,700,562 B2Axcelis Technologies, Inc.
- Method for particle beam-induced processing of a defect of a microlithographic photomask7 Jul 2026US 12,676,283 B2Carl Zeiss SMT GmbH
- Substrate analysis system7 Jul 2026US 12,676,288 B2Samsung Electronics Co., Ltd.
- Ion implanter and ion implantation method16 Jun 2026US 12,658,404 B2Sumitomo Heavy Industries Ion Technology Co., Ltd.
- Ion implanter and ion implantation method24 Sep 2026US 2026/0290748 A1Sumitomo Heavy Industries Material Solutions Co., Ltd.
- Charged particle beam device and deposition method17 Sep 2026US 2026/0279725 A1Kioxia Corporation
- Line edge smoothing with jittered twist13 Aug 2026US 2026/0237589 A1Axcelis Technologies, Inc.
- Apparatus and techniques for substrate processing using independent ion source and radical source13 Aug 2026US 2026/0237601 A1APPLIED Materials.Inc.
- Method for particle beam-induced processing of a defect of a microlithographic photomask16 Jul 2026US 2026/0204510 A1Carl Zeiss SMT GmbH
Most cited
By later US patents
- Multijunction photovoltaic cells and panels using a silicon or silicon-germanium active substrate cell for space and terrestrial applications199US 6,340,788 B12002
- Method for maskless particle-beam exposure90US 7,777,201 B2IMS Nanofabrication GmbH · 2010
- Method for maskless particle-beam exposure73US 8,115,183 B2IMS Nanofabrication GmbH · 2012
- Dose modulation and pixel deflection for raster scan lithography66US 5,393,987 AEtec Systems, Inc. · 1995
- Electron beam lithography system and method63US 5,334,282 AHitachi, Ltd. · 1994